Abstract
We present the results of an experimental study of multiple scattering of positively charged high-energy particles in bent samples of monocrystalline silicon. This work confirms the recently discovered effect of a strong reduction in the rms multiple scattering angle of particles channeled in the silicon (111) plane. The effect is observed in the plane orthogonal to the bending plane. We show in detail the influence of angular constraints on the magnitude of the effect. Comparison of the multiple scattering process at different energies indicates a violation of the law of inverse proportionality of the rms angle of channeled particles with energy. By increasing the statistics, we have improved the results of multiple scattering measurements for particles moving, but not channeled, in silicon crystals.
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This manuscript has associated data in a data repository. [Authors’ comment: All data included in this manuscript are available upon request by contacting the corresponding author.]
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Acknowledgements
The Imperial College group thanks the UK Science and Technology Facilities Council for financial support. The INFN authors acknowledge the support of the ERC Ideas Consolidator Grant No. 615089 CRYSBEAM. The IHEP participants of UA9 experiment acknowledge financial support of Russian Science Foundation (grant 17-12-01532). The corresponding author would like to thank V.V. Tikhomirov for useful discussion.
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Scandale, W., Arduini, G., Cerutti, F. et al. Multiple scattering of channeled and non-channeled positively charged particles in bent monocrystalline silicon. Eur. Phys. J. Plus 137, 811 (2022). https://doi.org/10.1140/epjp/s13360-022-03034-6
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DOI: https://doi.org/10.1140/epjp/s13360-022-03034-6