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Theory and molecular simulations of plasma sputtering, transport and deposition processes

  • Topical Review - Plasma Physics
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Abstract

The present review provides an overview of the basic theory of sputtering with recent models, focusing in particular on sputtered atom energy distribution functions. Molecular models such as Monte-Carlo, kinetic Monte-Carlo, and classical Molecular Dynamics simulations are presented due to their ability to describe the various processes involved in sputter deposition at the atomic and molecular scale as required. The sputter plasma, the sputtering mechanisms, the transport of sputtered material and its deposition leading to thin film growth can be addressed using these molecular simulations. In all cases, the underlying methodologies and some selected mechanisms are highlighted.

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Data Availability Statement

This manuscript has no associated data or the data will not be deposited. [Authors’ comment: The paper is a review article and we have not generated any data.]

Change history

  • 16 April 2023

    Author biographies have been added to the article.

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Acknowledgements

This work was supported by SAFRAN Tech—Université d’Orléans – CNRS grant #LS 245305 and Conseil Regional du Centre – Val de Loire under Grant MATEX-202100145829. Elizabeth Rowley-Jolivet is gratefully acknowledged for English language editing.

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  1. GREMI CNRS – Université d’Orléans, 14 Rue d’Issoudun, BP6744, 45067, Orléans Cedex 2, France

    Pascal Brault & Anne-Lise Thomann

  2. SAFRAN Tech, Rue des jeunes Bois, Chateaufort, CS 80112, 78772, Magny-Les-Hameaux, France

    Marjorie Cavarroc

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Brault, P., Thomann, AL. & Cavarroc, M. Theory and molecular simulations of plasma sputtering, transport and deposition processes. Eur. Phys. J. D 77, 19 (2023). https://doi.org/10.1140/epjd/s10053-023-00592-x

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