Skip to main content
Log in

Influence of the surface conditions on rf plasma characteristics

  • Topical issue: 23rd Symposium on Plasma Physics and Technology
  • Published:
The European Physical Journal D Aims and scope Submit manuscript

Abstract

The secondary electron emission is a surface dependent phenomenon, more influenced by surface preparation than by the material itself. The present paper deals with the effect of the electrode surface conditions: clean (atomically clean) and contaminated electrodes (standard conditions even after mechanical and chemicals cleaning) on the characteristics of an asymmetric discharge by PIC/MCC simulations. In the arrangement with one clean and one contaminated electrode the discharge characteristics strongly depend upon which electrode is powered. The obtained PIC/MCC simulation results indicate that contamination of electrodes and variations of the secondary electron emission coefficients can lead to more or less significant changes in properties of rf plasmas.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  • V.A. Godyak, R.B. Piejak, B.M. Alexandrovich, J. Appl. Phys. 69, 3455 (1991)

    Google Scholar 

  • M.A. Lieberman, A.J. Lichtenberg, Principles of Plasmas Discharges and Material Processing (Wiley, New York, 1994)

  • T. Makabe, Z.Lj. Petrović, Advances in Low Temperature RF Plasmas (Elsevier, New York, 2002)

  • T. Makabe, Z.Lj. Petrović, Plasma Electronics: Applications in Microelectronic Device Fabrication (Taylor & Francis, 2006)

  • J.P. Molnar, Phys. Rev. 83, 940 (1951)

    Google Scholar 

  • P.H. Mahadevan, J.K. Layton, D.B. Medvedev, Phys. Rev. 129, 79 (1963)

    Google Scholar 

  • P.H. Mahadevan, G.D. Magnuson, J.K. Layton, C.E. Carlston, Phys. Rev. 140, A1407 (1965)

  • G. Holmen, B. Svensson, J. Schou, P. Sigmund, Phys. Rev. B 20, 2247 (1979)

    Google Scholar 

  • A. Itoh, T. Majima, F. Obata, Y. Hamamoto, A. Yogo, Nucl. Instrum. Meth. B 192, 626 (2002)

    Google Scholar 

  • A. Bogaerts, R. Gijbels, Plasma Sources Sci. Technol. 11, 27 (2002)

    Google Scholar 

  • S. Kakuta, F. Tochikubo, Z.Lj. Petrović, T. Makabe, J. Appl. Phys. 74, 4923 (1993)

    Google Scholar 

  • R. Krimke, H.M. Urbassek, J. Phys. D 29, 378 (1996)

    Google Scholar 

  • D. Marić, K. Kutasi, G. Malović, Z. Donk, Z.Lj. Petrović, Eur. Phys. J. D 21, 73 (2002)

    Google Scholar 

  • L. Jolivet, J.F. Roussel, IEEE Trans. Plasma Sci. 30, 318 (2001)

    Google Scholar 

  • S.F. Biagi, D. Duxbury, E. Gabathuler, Nucl. Instrum. Meth. A 419, 438 (1998)

    Google Scholar 

  • A. DiMauro, E. Nappi, F. Posa, A. Breskin, A. Ozulutskov, R. Chechik, S.F. Biagi, G. Paic, F. Piuz, Nucl. Instrum. Meth. A 371, 137 (1996)

    Google Scholar 

  • V.Lj. Marković, S.R. Gocić, S.N. Stamenković, Z.Lj. Petrović, M. Radmilović, Eur. Phys. J. Appl. Phys. 4, 171 (2001)

    Google Scholar 

  • D. Mariotti, J.A. McLaughlin, P. Maguire, Plasma Sources Sci. Technol. 13, 207 (2004)

    Google Scholar 

  • M. Radmilović-Radjenović, J.K. Lee, Phys. Plasmas 15, (2005)

  • C. Punset, J.P. Boeuf, L.C. Pitchford, J. Appl. Phys. 83, 1884 (1998)

    Google Scholar 

  • V.P. Nagorny, P.J. Drallos, W. Williamson, Jr, J. Appl. Phys. 77, 3645 (1995)

    Google Scholar 

  • S.S. Yang, S.M. Lee, F. Iza, J.K. Lee, J. Phys. D: Appl. Phys. 39, 2775 (2006)

    Google Scholar 

  • T.B. Frooninckx, J.J. Sojka, J. Geophys. Res. 97, 2985 (1992)

    Google Scholar 

  • M. Radmilović-Radjenović, J.K. Lee, F. Iza, G.Y. Park, J. Phys. D 38, 950 (2005)

    Google Scholar 

  • M. Radmilović-Radjenović, B. Radjenović, Plasma Sources Sci. Technol. 16, 337 (2007)

    Google Scholar 

  • M. Radmilović-Radjenović, B. Radjenović, Contrib. Plasma Phys. 47, 165 (2007)

    Google Scholar 

  • A. Qayyum, I. Mehmood, W. Ahmad, The Nucleus 41, 1 (2004)

    Google Scholar 

  • E.V. Barnat, G.A. Hebener, J. Appl. Phys. 98, 013305 (2005)

    Google Scholar 

  • A.V. Phelps, Z.Lj. Petrović, Plasma Sources Sci. Technol. 8, R21 (1999)

  • C.K. Birdsall, IEEE Trans. Plasma Sci. 19, 65 (11991)

    Google Scholar 

  • J.P. Verboncoeur, M.V. Alves, V. Vahedi, C.K. Birdsall, J. Comput. Phys. 104, 321 (1993)

    Google Scholar 

  • V. Vahedi, M. Surendra, Comput. Phys. Commun. 87, 179 (1995)

    Google Scholar 

  • N.Yu Babaeva, J.K. Lee, J.W. Shon, J. Phys. D: Appl. Phys. 38, 287 (2005)

    Google Scholar 

  • I.V. Schweigert, V.A. Schweigert, Plasma Sources Sci. Technol. 13, 315 (2004)

    Google Scholar 

  • H.C. Kim, O. Manuilenko, J.K. Lee, Jpn J. Appl. Phys. 44, 1957 (2005)

    Google Scholar 

  • E.J. Sternglass, Phys. Rev. 108, 1 (1957)

    Google Scholar 

  • J.P. Boeuf, Phys. Rev. A 36, 2782 (1987)

    Google Scholar 

  • M. Soji, M. Sato, J. Phys. D: Appl. Phys. 32, 1640 (1999)

  • H.B. Smith et al., Phys. Plasmas 10, 875 (2003)

  • A.V. Phelps, L.C. Pitchford, C. Pedoussat, Z. Donko, Plasma. Sources Sci. Technol. 8, B1 (1999)

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to M. Radmilović-Radjenović.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Radmilović-Radjenović, M., Petrović, Z. Influence of the surface conditions on rf plasma characteristics. Eur. Phys. J. D 54, 445–449 (2009). https://doi.org/10.1140/epjd/e2009-00004-2

Download citation

  • Received:

  • Revised:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1140/epjd/e2009-00004-2

PACS

Navigation