Abstract
We herein present the development of sensitive halogen sensors based on InN nanocolumns (NCs) directly grown onto p-Si(111). Their activation with InN QDs then followed this growth by using plasma-assisted molecular beam epitaxy (PA-MBE). The activated NCs were then probed for their morphological, structural, optical, and electrical properties. Atomic force microscopy divulges the presence of the InN QDs on top of the NCs, which further confirm by deconvoluted two peaks in PL measurements. The XPS valance band measurements confirm the pinning to the conduction band with ∼ 0.15 eV, which manifests the presence of positively charged surface donor states. We further have utilized these surface donor states and investigated these activated NCs toward halogen ions. The results demonstrated the sensitivity of 0.724 µF/cm2/M, 2.32 mF/m2/M, and 0.95 mF/cm2/M, for fluoride, chloride, and bromide ions, respectively. Moreover, we have not observed any effect due to hydroxide ions on the areal capacitance of the InN NCs.
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Acknowledgements
PK acknowledges SERB Project ECR/2018/001491” for financial support. RJ acknowledges CSIR-Senior Research Fellowship by CSIR India. The authors also extend their sincere appreciation to Researchers Supporting Project Number (RSP-2020/130) at King Saud University, Riyadh, Saudi Arabia, for financial support.
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Jain, R., Lokku, V.K., Ahmed, J. et al. Activated InN nanocolumns as sensitive halogen sensor. J Mater Sci: Mater Electron 32, 1759–1765 (2021). https://doi.org/10.1007/s10854-020-04943-x
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DOI: https://doi.org/10.1007/s10854-020-04943-x