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Local Laser Bonding for Low Temperature Budget

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Transducers ’01 Eurosensors XV

Summary

A new bonding process for Si-wafer has been developed. The bonding is provided through intermediate layers such as Al or Au forming an eutectic alloy with silicon. A focused laser beam is used to heat up the contact site locally to temperatures well above the eutectic temperature of the corresponding alloys. Depending on the laser wavelength used the bond partner might be pyrex or silicon. This bonding process is especially suitable for bonding wafers containing devices with low temperature budget. The bonding strength of about 40 MPa is comparable to that of anodic bonding. The presented technique allows for a considerable reduction of the area needed for proper bonding. Furthermore, it provides for electrical contacts between the cap wafer and the device wafer so that new functions can be integrated into the cap.

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References

  1. D. I. Pomerantz (P.R. Mallory & Co.), US-Pat. 3 397 278 (1968)

    Google Scholar 

  2. F. Secco D’Aragona and L. Ristic “Silicon direct wafer bonding” in “Sensor technology and devices”, Artec House (1994) 157–201, ed. Ristic

    Google Scholar 

  3. R.F. Wolffenbuttel: „Low-temperature silicon wafer-to-wafer bonding using gold at eutectic temperature”, Sensors and Actuators A, 43 (1994), 223–229

    Article  Google Scholar 

  4. A. L. Tiensuu et al. “Assembling three-dimensional microstructures using gold-silicon eutectic bonding”, Sensors and Actuators A 45 (1994), 227–236

    Article  Google Scholar 

  5. M.I. Cohen, “Laser-Handbook II”, North-Holland Publishing, Amsterdam

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  6. C. Lizeau, “Entwicklung eines laserunterstützten Bondprozesses für Anwendungen in der Mikromechanik”, Diplomarbeit Ravensburg-Weingarten, FB Physikalische Technik, 1999

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© 2001 Springer-Verlag Berlin Heidelberg

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Mescheder, U.M., Alavi, M., Hiltmann, K., Lizeau, C., Nachtigall, C., Sandmaier, H. (2001). Local Laser Bonding for Low Temperature Budget. In: Obermeier, E. (eds) Transducers ’01 Eurosensors XV. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-59497-7_51

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  • DOI: https://doi.org/10.1007/978-3-642-59497-7_51

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-42150-4

  • Online ISBN: 978-3-642-59497-7

  • eBook Packages: Springer Book Archive

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