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Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge

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Abstract

The influence of the He, Ne and Ar on Xe plasma pumped by capillary discharge process is studied theoretically and experimentally. The charge-state populations and average ionization of Xe as a function of electron temperature for pure Xe and mixed gases are calculated with a collision-radiation model. The emission of Xe10+ 4d 8-4d 75p 13.5 nm in 2% bandwidth is obtained by a EUV emission monitor (E-Mon). Additional He/Ne/Ar gas can influence on the time scale and the intensity of the appearance for the E-Mon signals by effecting the electron density and temperature.

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References

  1. M.A. Klosner, W.T. Silfvast, Opt. lett. 23, 1609 (1998)

    Article  ADS  Google Scholar 

  2. U. Stamm, J. Kleinschmidt, K. Gäbel, H. Birner, I. Ahmad, Conference on Emerging Lithographic Technologies VIII, 2004, Vol. 5374, p. 133

  3. P.A.C. Jansson, B.A.M. Hansson, Appl. Phys. Lett. 84, 2256 (2004)

    Article  ADS  Google Scholar 

  4. T. Inoue, H. Okino, P.E. Nica, S. Amano, S. Miyamoto, T. Mochizuki, Rev. Sci. Instrum. 78, 105105 (2007)

    Article  ADS  Google Scholar 

  5. M. McGeoch, Appl. Opt. 37, 1651 (1998)

    Article  ADS  Google Scholar 

  6. I.V. Fomenkov, N. B wering, C.L. Rettig, S.T. Melnychuk, I.R. Oliver, J.R. Hoffman, O.V. Khodykin, R.M. Ness, W.N. Partlo, J. Phys. D 37, 3266 (2004)

    Article  ADS  Google Scholar 

  7. K. Nowakowska-Langier, L. Jakubowski, E.O. Baronova, K. Czaus, M. Rabinski, M.J. Jakubowski, Eur. Phys. J. D 54, 377 (2009)

    Article  ADS  Google Scholar 

  8. K. Bergmann, S. Danylyuk, L. Juschkin, J. Appl. Phys. 106, 073309 (2009)

    Article  ADS  Google Scholar 

  9. N.R. Fornaciari, H. Bender, D. Buchenauer, M.P. Kanouff, S. Karim, G.D. Kubiak, C.D. Moen, G.M. Shimkaveg, W.T. Silfvast, K.D. Stewart, Conference on Emerging Lithographic Technologies V, 2001, Vol. 4343, p. 226

  10. F. Gilleron, M. Poirier, T. Blenski, M. Schmidt, T. Ceccotti, J. Appl. Phys. 94, 2086 (2003)

    Article  ADS  Google Scholar 

  11. C.H. Zhang, P. Lv, S. Katsuki, H. Akiyama, in Proc. of the 22nd Canadian Conference on Electrical and Computer Engineering, St John’s, Newfoundland, Canada, 2009, p. 958

  12. M. Poirier, T. Blenski, F. de Gaufridy de Dortan, F. Gilleron, J. Quant. Spectrosc. Radiat. Transfer 99, 482 (2006)

    Article  ADS  Google Scholar 

  13. D. Colombant, G. Tonon, J. Appl. Phys. 44, 3524 (1973)

    Article  ADS  Google Scholar 

  14. J. Zeng, C. Gao, J. Yuan, Eur. Phys. J. D 60, 309 (2010)

    Article  ADS  Google Scholar 

  15. Y. Teramoto, H. Sato, K. Bessho, K. Miyauchi, M. Ikeuchi, K. Okubo, M. Yoshioka, K. Toyoda, Conference on Emerging Lithographic Technologies VII, 2009, Vol. 5037, p. 767

  16. Y. Zhao, Q. Wang, Y. Xie, Y. Cheng, B. Luan, J. Plasma Phys. 74, 839 (2008)

    Article  Google Scholar 

  17. Y. Zhao, Y. Cheng, B. Luan, Y. Wu, Q. Wang, J. Phys. D 39, 342 (2006)

    Article  ADS  Google Scholar 

  18. B. Huang, Y. Takimoto, M. Watanabe, E. Hotta, Jpn J. Appl. Phys. 50, 06GB09 (2011)

    Article  Google Scholar 

  19. Q. Zhu, T. Muto, J. Yamada, N. Kishi, M. Watanabe, J. Appl. Phys. 110, 123302 (2011)

    Article  ADS  Google Scholar 

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Authors and Affiliations

  1. National Key Laboratory of Science and Technology on Tunable laser, Harbin Institute of Technology, Harbin, 150001, P.R. China

    Qiang Xu, Yongpeng Zhao, Yang Liu, Qi Li & Qi Wang

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  1. Qiang Xu
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  2. Yongpeng Zhao
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  3. Yang Liu
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  4. Qi Li
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  5. Qi Wang
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Correspondence to Qiang Xu.

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Xu, Q., Zhao, Y., Liu, Y. et al. Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge. Eur. Phys. J. D 67, 125 (2013). https://doi.org/10.1140/epjd/e2013-30500-5

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  • DOI: https://doi.org/10.1140/epjd/e2013-30500-5

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