Abstract
The chemical reactions in the SiCl4-Si-H2 system using a low temperature hydrogenation technique related to the Siemens process were studied based on thermodynamics. The diagrams of standard Gibbs free energy of formation and equilibrium constants for seven reactions used as a function of temperature in this system were calculated and plotted for a temperature range of 473 K to 1073 K. It showed that the lower the temperature, the larger the conversion ratio of SiCl4. The equilibrium composition of gaseous species in the SiCl4-Si-H2 system with different initial SiCl4/H2 ratio and systematic pressure was calculated and the corresponding conversion ratio of SiCl4 was obtained. The conversion ratio was improved by increasing the initial ratio of H2 in raw materials and the systematic pressure but was reduced with the increase of temperature. The conversion ratio of SiCl4 reached 0.41 with an initial SiCl4/H2 ratio of 1/5 and a systematic pressure of 5 MPa at 473 K.
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Wu, J., Chen, Z., Ma, W. et al. Thermodynamic Estimation of Silicon Tetrachloride to Trichlorosilane by a Low Temperature Hydrogenation Technique. Silicon 9, 69–75 (2017). https://doi.org/10.1007/s12633-015-9353-0
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DOI: https://doi.org/10.1007/s12633-015-9353-0