Binary Mixtures of SH- and CH3-Terminated Self-Assembled Monolayers to Control the Average Spacing Between Aligned Gold Nanoparticles
- Asad RezaeeAffiliated withDepartment of Physics and Astronomy, The University of Western Ontario
- , Laura C PavelkaAffiliated withDepartment of Chemistry, The University of Western Ontario
- , Silvia MittlerAffiliated withDepartment of Physics and Astronomy, The University of Western Ontario Email author
This paper presents a method to control the average spacing between organometallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs) in a line. Focused ion beam patterned CH3-terminated self-assembled monolayers are refilled systematically with different mixtures of SH- and CH3-terminated silanes. The average spacing between OMCVD Au NPs is demonstrated systematically to decrease by increasing the v/v% ratio of the thiols in the binary silane mixtures with SH- and CH3-terminated groups.
KeywordsAverage spacing FIB Gold Nanoparticle OMCVD Self-assembly
- Binary Mixtures of SH- and CH3-Terminated Self-Assembled Monolayers to Control the Average Spacing Between Aligned Gold Nanoparticles
- Open Access
- Available under Open Access This content is freely available online to anyone, anywhere at any time.
Nanoscale Research Letters
- Online Date
- August 2009
- Online ISSN
- Springer New York
- Additional Links
- Average spacing