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Roughness and texture correlation of Al films

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Abstract

Titanium films prepared by standard direct-current (DC) magnetron physical vapor deposition (PVD) and ionized metal plasma PVD (I-PVD), with Al (0.5wt.%Cu) films on them, were studied. The surface roughness, reflectivity, and crystalline texture of Ti on SiO2/Si and Al on TiN/Ti/SiO2/Si were investigated with the same thickness of Al, TiN, and Ti. The surface roughness of Al films with Ti/TiN underlayers was found to be capable of monitoring Al(111) texture. So, the reflectivity of Al/TiN/Ti film stack can be used as a quick monitor for the electromigration (EM) lifetime.

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Authors and Affiliations

  1. Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050, Shanghai, China

    Wenjie Zhang & Leeward Yi

  2. Graduate School of Chinese Academy of Sciences, 100049, Beijing, China

    Wenjie Zhang & Leeward Yi

  3. Grace Semiconductor Manufacturing Corporation, 201203, Shanghai, China

    Juineng Tu, Pingyi Chang, Duli Mao & Jin Wu

Authors
  1. Wenjie Zhang
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  2. Leeward Yi
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  3. Juineng Tu
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  4. Pingyi Chang
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  5. Duli Mao
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  6. Jin Wu
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Zhang, W., Yi, L., Tu, J. et al. Roughness and texture correlation of Al films. J. Electron. Mater. 34, 1307–1309 (2005). https://doi.org/10.1007/s11664-005-0254-7

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  • DOI: https://doi.org/10.1007/s11664-005-0254-7

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