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Abatement of Gaseous Xylene Using Double Dielectric Barrier Discharge Plasma with In Situ UV Light: Operating Parameters and Byproduct Analysis

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Abstract

Ultraviolet (UV) light with a wavelength of 254 nm was applied to a double dielectric barrier discharge (DDBD) system to decompose of gaseous xylene. The results show that a significantly synergistic effect can be achieved with the introduction of UV light into the DDBD system. When UV light is applied, the system show a 21.8 % increase in its removal efficiency for xylene at 35 kV with an ozone concentration close to 971 ppmv. The CO x (x = CO2 and CO) selectivity of outlet gas rises from 6.54 to 76.2 %. The optimal synergetic effect between UV light and DDBD can be obtained at a peak voltage of 30 kV. The system is robust for humidity, which only slightly reduces the xylene removal efficiency at a high peak voltage (30–35 kV). With the increase of gas flow rate, the removal efficiency for xylene decreases due to a reduced residence time. In addition, the products of xylene degradation were also analyzed. The major products of the degradation were found to be CO2 and H2O while byproducts such as O3 and HCOOH were observed as well.

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Acknowledgments

This work was supported by the National Natural Science Foundation of China through (Grant Numbers 21450110411, 21476191, 91434110).

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Authors and Affiliations

  1. Key Laboratory of Biomass Chemical Engineering of Ministry of Education, College of Chemical and Biological Engineering, Zhejiang University, Hangzhou, China

    Yao Shi, Zhenhua Shao, Tianyu Shou & Yi He

  2. Hangzhou Create Environmental Technology Co., Ltd., Hangzhou, China

    Rubin Tian & Jianqing Jiang

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  1. Yao Shi
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  2. Zhenhua Shao
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  3. Tianyu Shou
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  4. Rubin Tian
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  5. Jianqing Jiang
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  6. Yi He
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Correspondence to Yi He.

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Shi, Y., Shao, Z., Shou, T. et al. Abatement of Gaseous Xylene Using Double Dielectric Barrier Discharge Plasma with In Situ UV Light: Operating Parameters and Byproduct Analysis. Plasma Chem Plasma Process 36, 1501–1515 (2016). https://doi.org/10.1007/s11090-016-9741-2

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  • DOI: https://doi.org/10.1007/s11090-016-9741-2

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