Abstract
Nanoscaled tungsten oxide thin films were fabricated by galvanostatic electrodeposition. The effect of preparation parameters such as tungsten ions concentration, pH, current density and annealing on the properties and performance of WO3 thin films electrochromic materials was investigated. XRD, SEM–EDS, TEM, FTIR, UV–VIS spectrophotometry, and electrochemical measurements were utilized to characterize the structural and compositional properties as well as the electrochromic behaviour of the prepared thin films. Triclinic WO3 structure was prepared at 0.1 M W+ and current density of 0.5 mA cm−2, while at 0.2 M W+ and 1 mA cm−2, orthorhombic structure was revealed. High energy gap of 3.5 eV with diffusion coefficient of 6.81 × 10−11 cm2 S−1 and coloration efficiency of 62.68 cm2 C−1 were obtained for the films prepared at pH 2, 1 mA cm−2, and 0.1 M W+.
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Soliman, H.M.A., Kashyout, A.B., El Nouby, M.S. et al. Preparation and characterizations of tungsten oxide electrochromic nanomaterials. J Mater Sci: Mater Electron 21, 1313–1321 (2010). https://doi.org/10.1007/s10854-010-0068-0
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DOI: https://doi.org/10.1007/s10854-010-0068-0