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Fabrication of X-ray imaging zone plates by e-beam and X-ray lithography

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Abstract

X-ray imaging and microscopy techniques have been developed in worldwide due to their capabilities of large penetration power and high spatial resolution. Fresnel zone plates is considered to be one of the most convenient optic devices for X-ray imaging and microscopy system. The zone plates with aspect ratio of 7 and 13 have been fabricated by e-beam lithography combined with X-ray lithography in this paper. Firstly, the X-ray lithography mask of zone plates with outermost zone width of 100 nm was fabricated by e-beam lithography and gold electroplating techniques. Secondly, the zone plates with gold profile thickness of 700 and 1,300 nm were replicated by X-ray lithography and gold electroplating techniques. X-ray imaging and microscopy techniques were introduced to characterize the high-aspect-ratio zone plates’ inner structures. At the X-ray energy of 7.5 keV, the first-order focusing efficiency of zone plates with gold profile thickness of 700 nm is about 8.63%.

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References

  • Altissimo M, Romanato F, Vaccari L, Businaro L, Cojoc D, Kaulich B, Cabrini S, Fabrizio ED (2002) X-ray lithography fabrication of a zone plate for X-rays in the range from 15 to 30 keV. Microelectron Eng 61–62:173–177. doi:10.1016/S0167-9317(02)00444-6

    Article  Google Scholar 

  • Anbumony K, Lee SY (2006) True three-dimensional proximity effect correction in electron-beam lithography. J Vac Sci Technol B 24(6):3115–3120. doi:10.1116/1.2388960

    Article  Google Scholar 

  • Chao WL, Harteneck BD, Liddle JA, Anderson EH, Attwood DT (2005) Soft X-ray microscopy at a spatial resolution better than 15 nm. Nature 435:1210–1213. doi:10.1038/nature03719

    Article  Google Scholar 

  • Chen J, Wu CY, Tian JP, Li WJ, Yu SH, Tian YC (2008) Three-dimensional imaging of a complex concaved cuboctahedron copper sulfide crystal by X-ray nanotomography. Appl Phys Lett 92:233104. doi:10.1063/1.2943337

    Article  Google Scholar 

  • David C, Kaulich B, Barrett R, Salome M, Susini J (2000) High-resolution lenses for sub-100 nm X-ray fluorescence microscopy. Appl Phys Lett 77(23):3851–3853. doi:10.1063/1.1329638

    Article  Google Scholar 

  • Divan R, Mancini DC, Moldovan N, Lai B, Assoufid L, Leonard Q, Cerrina F (2002) Progress in the fabrication of high-aspect-ratio zone plates by Soft X-ray lithography. SPIE 4783:82–91. doi:10.1117/12.451019

    Article  Google Scholar 

  • Feng Y, Feser M, Lyon A, Rishton S, Zeng XH, Chen S, Sassolini S, Yun WB (2007) Nanofabrication of high aspect ratio 24 nm X-ray zone plates for X-ray imaging applications. J Vac Sci Technol B 25(6):2004–2007. doi:10.1116/1.2789447

    Article  Google Scholar 

  • Hambacha D, Peukera M, Schneider G (2001) Nanostructured diffractive optical devices for soft X-ray microscopes. Nucl Instrum Method Phys Res A 467–468:877–880. doi:10.1016/S0168-9002(01)00507-1

    Article  Google Scholar 

  • Liu LH, Liu G, Xiong Y, Chen J, Kang CL, Huang XL, Tian YC (2008) Fabrication of Fresnel zone plates with high aspect ratio by soft X-ray lithography. Microsyst Technol 14:1251–1255. doi:10.1007/s00542-007-0542-7

    Article  Google Scholar 

  • Ma YS, Cheng YC, Cerrina F, Barwicz T, Smith HI (2007) Local line edge roughness in microphotonic devices: an electron-beam lithography study. J Vac Sci Technol B 25(1):235–241. doi:10.1116/1.2426978

    Article  Google Scholar 

  • Spector SJ, Jacobsen CJ, Tennant DM (1997) Process optimization for production of sub-20 nm soft X-ray zone plates. J Vac Sci Technol B 15(6):2872–2876. doi:10.1116/1.589747

    Article  Google Scholar 

  • Wang DQ, Cao LF, Xie CQ, Liu M, Ye TC (2006) Microzone plates with high-aspect ratio fabricated by e-beam and X-ray lithography. J Microlithogr Microfabr Microsyst 5(1):013002. doi:10.1117/1.2170110

    Article  Google Scholar 

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Acknowledgments

The authors gratefully acknowledge Dr. Ke Liu, Prof. Guoqiang Pan and XRDS beamline group at NSRL. The research is supported by National Science Foundation of China (No.10675113 and No.10734070) and National High Technology R&D Program of China (2008AA04Z303).

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Authors and Affiliations

  1. National Synchrotron Radiation Laboratory, University of Science and Technology of China, 230029, Hefei, Anhui, People’s Republic of China

    Longhua Liu, Gang Liu, Ying Xiong, Jie Chen, Wenjie Li & Yangchao Tian

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  1. Longhua Liu
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  2. Gang Liu
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  3. Ying Xiong
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  4. Jie Chen
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  5. Wenjie Li
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  6. Yangchao Tian
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Correspondence to Gang Liu.

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Liu, L., Liu, G., Xiong, Y. et al. Fabrication of X-ray imaging zone plates by e-beam and X-ray lithography. Microsyst Technol 16, 1315–1321 (2010). https://doi.org/10.1007/s00542-009-0972-5

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  • DOI: https://doi.org/10.1007/s00542-009-0972-5

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