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Ion beam lithography with gold and silicon ions

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Abstract

Different ion species deliver a different material sputtering yield and implantation depth, thus enabling focused ion beam (FIB) fabrication for diverse applications. Using newly developed FIB milling with double charged \(\hbox {Au}^{2+}\) and \(\hbox {Si}^{2+}\) ions, fabrication has been carried out on Au-sputtered films to define arrays of densely packed nanoparticles supporting optical extinction peaks at visible-IR wavelengths determined by the size, shape, and proximity of nanoparticles. Results are qualitatively compared with \(\hbox {Ga}^{+}\) milling. A possibility to use such ion implantation to tailor the etching rate of silicon is also demonstrated.

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Acknowledgments

We acknowledge support by ARC Linkage LP120100161 and Discovery DP130101205, DP120102980 grants. SJ acknowledge a startup funding of Nanotechnology facility by Swinburne University of Technology.

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Authors and Affiliations

  1. Centre for Micro-Photonics, Faculty of Science, Engineering and Technology, Swinburne University of Technology, Hawthorn, VIC, 3122, Australia

    Gediminas Seniutinas, Armandas Balčytis & Saulius Juodkazis

  2. Melbourne Centre for Nanofabrication, Australian National Fabrication Facility, Clayton, VIC, 3168, Australia

    Gediminas Seniutinas, Armandas Balčytis & Saulius Juodkazis

  3. Department of Electrical and Computer Engineering, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama, 240-8501, Japan

    Yoshiaki Nishijima

  4. Raith GmbH, Konrad-Adenauer-Allee, 8, 44263, Dortmund, Germany

    Achim Nadzeyka & Sven Bauerdick

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  1. Gediminas Seniutinas
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  2. Armandas Balčytis
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  3. Yoshiaki Nishijima
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  4. Achim Nadzeyka
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  6. Saulius Juodkazis
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Correspondence to Gediminas Seniutinas.

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Seniutinas, G., Balčytis, A., Nishijima, Y. et al. Ion beam lithography with gold and silicon ions. Appl. Phys. A 122, 383 (2016). https://doi.org/10.1007/s00339-016-9866-4

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  • DOI: https://doi.org/10.1007/s00339-016-9866-4

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