Microsystem Technologies

, Volume 20, Issue 10, pp 1797–1802

High-aspect-ratio nanoporous membranes made by reactive ion etching and e-beam and interference lithography

Authors

    • Argonne National LaboratoryCenter for Nanoscale Materials
  • Olga V. Makarova
    • Creatv MicroTech Inc.
  • Shelby Skoog
    • Joint Department of Biomedical EngineeringUniversity of North Carolina and North Carolina State University
  • Roger Narayan
    • Joint Department of Biomedical EngineeringUniversity of North Carolina and North Carolina State University
  • Anirudha V. Sumant
    • Argonne National LaboratoryCenter for Nanoscale Materials
  • Cha-Mei Tang
    • Creatv MicroTech Inc.
  • Nicolaie Moldovan
    • Advanced Diamond Technologies Inc.
Technical Paper

DOI: 10.1007/s00542-013-1932-7

Cite this article as:
Divan, R., Makarova, O.V., Skoog, S. et al. Microsyst Technol (2014) 20: 1797. doi:10.1007/s00542-013-1932-7
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Abstract

Nanoporous membranes engineered to mimic natural filtration systems can be used in “smart” implantable drug delivery systems, hemodialysis membranes, bio-artificial organs, and other novel nano-enabled medical devices. Conventional membranes exhibit several limitations, including broad pore size distributions and low pore densities. To overcome these problems, lithographic approaches were used to develop porous silicon, silicon nitride, ultrananocrystalline diamond (UNCD), and polymer film membranes. Here we report processing of high porosity, high-aspect-ratio membranes by two techniques: UNCD fabricated by reactive ion etching after e-beam lithography and epoxy fabricated by interference lithography.

Copyright information

© Springer-Verlag Berlin Heidelberg (outside the USA)  2013