Abstract
By means of chemical vapor deposition (CVD) in a quasi-closed space with the use of a separate vaporizer, indium and tin oxides (ITOs)/glass structures with high conductivity and transparency and a thickness of up to 3 μm are obtained; they are suitable for the manufacture of protective coatings of mirrors with a reflecting facial layer.
Similar content being viewed by others
References
Radziszewska, A., Structural and chemical composition studies of pulsed laser deposited β-Al–Mg thin films, J. Microscopy, 2009, vol. 237, no. 3, pp. 384–387.
Gordienko, Yu.E., Mazinov, A.S., and Yakovlev, D.R., Thin-film photovoltaic elements on the base of silicon alloys, Radioelektron. Informat., 2002, no. 2, pp. 22–27.
Sivukhin, D.V., Obshchii kurs fiziki. Optika (General Course of Physics. Optics), Moscow: Nauka, 1980, chap. 5, article65.
http://infotables.ru/fizika/375-koeffitsient-prelomleniya
Harea, E., Indentation size effect in ITO/Si planar structure under concentrated load action, Moldavian J. Phys. Sci., 2007, vol. 6, no.2.
Golan, G., Rabinovich, E., Axelevitch, A., et al., Thin films indentation size effects in microhardness measurements, J. Optoelectron. Adv. Mater., 2000, vol. 2, no. 4, pp. 317–325.
Konig, K., Krylov, P.N., Zakirova, R.M., and Fedotova, I.V., Optical properties of ITO films obtained by high-frequency magnetic sputtering with accompanying ion treatment, Semiconductors, 2013, vol. 47, no. 10, p. 1412.
Ryabtsev, S.V., Yukish, A.V., Khango, S.I., and Yurakov, Yu.A., Kinetic of resistive response of SnO2-x thin films in gas environment, Semiconductors, 2008, vol. 42, no. 4, p.481.
Untila, G.G., Kost, T.N., Chebotareva, A.B., et al., Effect of the temperature during deposition of AlOx films by spray pyrolysis on their passivating properties in a silicon solar cell, Fiz. Tekh. Poluprovodn., 2012, vol. 46, no. 6, p.832.
Atabaev, I.G., Khajiev, M.U., and Pak, V.A., Growth of ITO films by modified chemical vapor deposition method, Int. J. Thin Films Sci. Technol. Int. J. Thin. Fil. Sci. Tech., 2016, vol. 5, no. 1, pp. 13–16. doi: 10.18576/ijtfst/050102
Bazhin, A.I., Trotsan, A.N., Chertopalov, S.V., et al., Effect of magnetron spattering mode and reacting gas composition onto structure and properties of ITO films, Fiz. Inzh. Poverkhn., 2012, vol. 10, no. 4, pp. 342–348.
Choi, C.G., Lee No, K., Kim, W.-J., et al., Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering, Thin Solid Films, 1995, vol. 258, nos. 1–2, pp. 274–278.
Kikuchi, N., Kusano, E., Kishio, E., et al., Effect of excess oxygen introduced during sputter deposition on carrier mobility in as-deposited and postannealed indium-tin-oxide films, J. Vac. Sci. Technol. A, 2001, vol. 19, no. 4, pp. 1636–1641.
Geguzin, Ya.E., Poverkhnostnaya diffuziya i rastekanie (Surface Diffusion and Spreading), Moscow: Nauka, 1969.
Frank, G., Kauer, E., and Kostlin, H., Thin Solid Films, 1981, no. 77, p.107.
Atabaev, I.G., Hajiev, M.U., Pak, V.A., et al., Growth of transparent electrical conducting films of indium and tin oxides by chemical vapor deposition, Appl. Solar Energy, 2016, vol. 52, no. 2, p. 118.
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © I.G. Atabaev, M.U. Khazhiev, S.B. Zakirova, Z. Shermatov, 2017, published in Geliotekhnika, 2017, No. 4, pp. 42–46.
About this article
Cite this article
Atabaev, I.G., Khazhiev, M.U., Zakirova, S.B. et al. Correlation between the structure, specific resistance, and optical properties of ITO films grown by CVD. Appl. Sol. Energy 53, 322–325 (2017). https://doi.org/10.3103/S0003701X1704003X
Received:
Published:
Issue Date:
DOI: https://doi.org/10.3103/S0003701X1704003X