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Plasma technologies for material processing in nanoelectronics: Problems and solutions

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Abstract

The review considers plasma-processing technologies used in solid-state electronics, both widely used and ones, which do not found yet industrial applications. Several from them are developed specifically for creating nanoelectronic devices. Tendencies toward an increase in the working rate and memory volume and a decrease in the sizes of telecommunication systems necessitate the development of electronic devices based on new principles and, hence, the corresponding technologies for implementation. Physical problems that impede the application of conventional methods in new problems are analyzed, and possible solutions are proposed.

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Authors and Affiliations

  1. Kotel’nikov Institute of Radio Engineering and Electronics (Fryazino Branch), Russian Academy of Sciences, Fryazino, Moscow oblast, 141190, Russia

    E. G. Shustin

  2. Moscow Engineering Physics Institute (National Research Nuclear University), Moscow, 115409, Russia

    E. G. Shustin

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  1. E. G. Shustin
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Correspondence to E. G. Shustin.

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Original Russian Text © E.G. Shustin, 2017, published in Radiotekhnika i Elektronika, 2017, Vol. 62, No. 5, pp. 427–439.

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Shustin, E.G. Plasma technologies for material processing in nanoelectronics: Problems and solutions. J. Commun. Technol. Electron. 62, 454–465 (2017). https://doi.org/10.1134/S106422691704012X

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