Abstract
In this paper, a novel technique is introduced to make a shadow mask (SM) that is used in various electrical characterization techniques such as Hall-resistivity, magnetoresistance, and TLM (Transmission Line Method) ohmic contact measurements. By using this technology, a film thickness of about 0.25–0.30 μm was obtained after photoprocessing. We reached an SM thickness of 15–20 μm by electrodeposition, which is required for a sufficiently high toughness. It was observed that the sharpness of the masks was also fairly good. The SMs obtained using this technology have been successfully used in various applications.
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Coskun, C., Efeoglu, H. A Simple Method Producing Shadow Masks Used in Electrical Characterization Techniques. Instruments and Experimental Techniques 46, 410–412 (2003). https://doi.org/10.1023/A:1024443228073
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DOI: https://doi.org/10.1023/A:1024443228073