Abstract
Absolute line-of-sight averaged measurements of methyl radical concentrationsin a microwave plasma-assisted diamond deposition reactor arepresented. The measurements are based on the use of broadband ultravioletabsorption spectroscopy to characterize the distinguishing absorptionfeature of methyl at 216 nm associated with the X(2A″2)→(2A′1) electronictransition. The dependence of the line-of-sight methyl concentration andmole fractions with the percentage of methane in the feed-gas, plasma powerdensity, and position of substrate relative to the optical probe volume isstudied. The measurements suggest that the near-substrate methyl molefraction is only weakly sensitive to changes in substrate temperature andare largely influenced by the gas-phase temperature. A comparison is madebetween the measured mole fractions and recent predictions based on aone-dimensional model of this process. The measured mole fractions areconsistently greater than those predicted by about a factor of ten. Thisdiscrepancy is explained in part by the line-of-sight limitations in theexperimental facility.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
REFERENCES
A. Gicquel, M. Chenevier, and M. Lefebvre, in Handbook of Industrial Diamonds and Diamond Films, M. Prelas, G. Popovicci, and K. Bigelow, eds., Marcel Dekker, New York (1997), pp. 739–796.
D. G. Goodwin and J. E. Butler, in Handbook of Industrial Diamonds and Diamond Films, M. Prelas, G. Popovicci, and K. Bigelow, eds., Marcel Dekker, New York (1997), pp. 527–581.
A. Gicquel, Kh. Hassouni, S. Farhat, Y. Breton, C. D. Scott, M. Lefebvre, and M. Pealat, Diamond Related. Mater. 3, 581 (1994).
A. Gicquel, E. Anger, and C. Heau, in Microwave Discharge: Fundamentals and Applications, C. M. Ferreira and M. Moisan, eds., Plenum Press, New York (1993), p. 541.
A. Gicquel, E. Anger, M. F. Ravet, D. Fabre, G. Scatena, and Z. Z. Wang, Diamond Related Mater. 2, 417 (1993).
F. Silva, A. Gicquel, A. Tardieu, P. Cledat, and Th. Chauveau, Diamond Related Mater. 5, 338 (1996).
A. Gicquel, M. Chenevier, Kh. Hassouni, A. Tserepi, and M. Dubus, J. Appl. Phys. 83, 7504 (1998).
Kh. Hassouni, O. Leroy, S. Farhat, and A. Gicquel, Plasma Chem. Plasma Proc. 18, 325 (1998).
M. Capitelli, G. Colonna, Kh. Hassouni, and A. Gicquel, Plasma Chem. Plasma Proc. 16, 153 (1996).
M. H. Loh and M. A. Cappelli, Appl. Phys. Lett. 70, 1052 (1997).
M. A. Childs, K. L. Menningen, P. Chevako, N. W. Spellmeyer, L. W. Anderson, and J. E. Lawler, Phys. Lett. A 171, 87 (1992).
D. F. Davidson, A. Y. Chang, M. D. DiRosa, and R. K. Hanson, J. Quant. Spectrosc. Radiat. Transf. 49, 559 (1993).
D. F. Davidson, A. Y. Chang, M. D. DiRosa, and R. K. Hanson, J. Quant. Spectrosc. Radiat. Transf. 53, 581 (1995).
W. C. Gardiner, Jr., S. M. Hwang, and M. J. Rabinowitz, Energy Fuels 1, 545 (1987).
A. Gicquel, M. Chenevier, Y. Breton, M. Petiau, J. P. Booth, and Kh. Hassouni, J. Phys. III Fr. 6, 1167 (1996).
A. Gicquel, Kh. Hassouni, Y. Breton, M. Chenevier, and J. C. Cubertafon, Diamond Related Mater. 5, 366 (1996).
A. Gicquel, F. Silva, M. Dubus, Kh. Hassouni, and X. Duten, SPIE Proc. 3484, 61–75 (1998).
Kh. Hassouni, O. Leroy, S. Farhat, and A. Gicquel, Plasma Chem. Plasma Proc. 18, 325 (1998).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Cappelli, M.A., Owano, T.G., Gicquel, A. et al. Methyl Concentration Measurements During Microwave Plasma-Assisted Diamond Deposition. Plasma Chemistry and Plasma Processing 20, 1–12 (2000). https://doi.org/10.1023/A:1006985925431
Issue Date:
DOI: https://doi.org/10.1023/A:1006985925431