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Modification of growth parameters of Ti anodic films by fluoride ion insertion

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Abstract

The potentiostatic growth of Ti anodic films formed in 0.1 M HClO4/x M HF (0.05 M ≤ x ≤ 0.50 M) media was studied by electrochemical impedance spectroscopy, EIS. The obtained EIS spectra were analyzed by using the surface charge approach model, which showed oxide growth parameters being modified as the HF concentration increased. While the electric field through the film decreased, oxide growth rate and atomic half jump distance increased, evidencing that fluoride ions are inserted into the oxide through oxygen vacancies, thereby modifying the lattice structure and electric properties of the oxide. Additionally, the experimental data obtained for the pseudocapacitance C 0, appearing at low-frequency domain, allowed the interpretation commonly given for this element (modulation of film thickness) to be discarded; instead, the F− ion diffusion coefficient was estimated, casting with variation of electric properties with HF concentration and E F.

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References

  1. Roy P, Berger S, Schmuki P (2011) Agnew Chem Int Ed 50:2904–2939

    Article  CAS  Google Scholar 

  2. Albu SP, Ghicov A, Aldabergenova S, Drechsel P, LeClere D, Thompson GE, Macak JM, Schmuki P (2008) Adv Mater 20:4125–4139

    Google Scholar 

  3. Hebert KR, Houser JE (2009) J Electrochem Soc 156:C275–C281

    Article  CAS  Google Scholar 

  4. Bojinov M (1997) J Solid State Electrochem 1:161–171

    Article  CAS  Google Scholar 

  5. Bojinov M (1997) Electrochim Acta 42:3489–3498

    Article  CAS  Google Scholar 

  6. Frateur I, Cattarin S, Musiani M, Tribollet B (2002) J Electroanal Chem 482:202–210

    Google Scholar 

  7. Cattarin S, Musiani M, Tribollet B (2002) J Electrochem Soc 149:B457–B464

    Article  CAS  Google Scholar 

  8. Jović VD, Jović BM (2008) J Serb Chem Soc 73:351–367

    Article  Google Scholar 

  9. Kong D-S (2010) Langmuir 26:4880–4891

    Article  CAS  Google Scholar 

  10. Acevedo-Peña P, González I (2011) ECS Trans 36:257–265

    Article  Google Scholar 

  11. Peñafiel-Castro JA, Quintero-Torres R, de Taconi NR, Rajeshwar K, Chanmanee W (2011) J Electrochem Soc 158:D84–D90

    Article  Google Scholar 

  12. Acevedo-Peña P, González I (2012) J Electrochem Soc 159:C101–C108

    Article  Google Scholar 

  13. Di Quarto F, Di Paola A (1980) Sunser. J Electrochem Soc 127:1016–1021

    Article  Google Scholar 

  14. Acevedo-Peña P, Vázquez G, Laverde D, Pedraza-Rosas JE, Manríquez J, González I (2009) J Electrochem Soc 156:C377–C386

    Article  Google Scholar 

  15. Karastoyanov V, Bojinov M (2008) Mater Chem Phys 112:702–710

    Article  CAS  Google Scholar 

Download references

Acknowledgments

This work has been given the financial support from CONACyT (Project CB-2008/105655). Próspero Acevedo Peña is grateful to CONACyT for the PhD grant through the program doctorados nacionales.

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Authors and Affiliations

  1. Laboratory of Electrochemistry, Department of Chemistry, Universidad Autónoma Metropolitana-Iztapalapa (UAM-I), Apdo. Postal 55-534, 09340, Ciudad de México, DF, Mexico

    Próspero Acevedo-Peña & Ignacio González

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  1. Próspero Acevedo-Peña
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  2. Ignacio González
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Correspondence to Ignacio González.

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Acevedo-Peña, P., González, I. Modification of growth parameters of Ti anodic films by fluoride ion insertion. J Solid State Electrochem 16, 2709–2715 (2012). https://doi.org/10.1007/s10008-012-1685-8

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  • DOI: https://doi.org/10.1007/s10008-012-1685-8

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