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Pulsed laser deposition of PbTe films on glass substrates

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Abstract.

PbTe thin films were prepared by pulsed laser deposition from a Nd:YAG laser (532 nm). The films were deposited on glass substrates. The influence of deposition temperature (80–160 °C), fluence (5–13 J/cm2) and nominal composition of the target on the chemical composition of the films was studied. It was found that the tellurium content of the film is strongly dependent on both the laser fluence and the deposition temperature. Highly textured stoichiometric films can be obtained with suitable conditions.

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Authors and Affiliations

  1. Laboratoire de Physique des Matériaux, UMR CNRS-UHP-INPL 7556, Ecole des Mines de Nancy, Parc de Saurupt, 54042 Nancy, France, , , , , , FR

    A. Jacquot, B. Lenoir, M.O. Boffoué & A. Dauscher

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  1. A. Jacquot
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  2. B. Lenoir
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  3. M.O. Boffoué
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  4. A. Dauscher
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Received: 21 July 1999 / Accepted: 11 September 1999 / Published online: 28 December 1999

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Jacquot, A., Lenoir, B., Boffoué, M. et al. Pulsed laser deposition of PbTe films on glass substrates . Appl Phys A 69 (Suppl 1), S613–S615 (1999). https://doi.org/10.1007/s003390051488

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  • DOI: https://doi.org/10.1007/s003390051488

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