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Fabrication of three-dimensional microstructures in positive photoresist through two-photon direct laser writing

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Abstract

Three-dimensional (3D) microstructures with micron scale are fabricated in photoresist using two-photon direct laser writing with an infrared femtosecond laser at 800 nm. The positive photoresist of Novolak/diazonaphthoquinone (DNQ) is used for the fabrication of line structures and 3D microstructures. Linewidths of line structures are fabricated with laser power ranging from 1 to 15 mW and scanning speeds ranging from 5 to 50 μm s−1. The obtained linewidth is analyzed using an exposure kinetics model of DNQ for two-photon absorption. Both 3D inversed woodpile structures and helical structures are fabricated.

Graphical abstract

Two-photon direct laser writing is used to fabricate microstructures in positive photoresist. Microstructures with helical and inversed woodpile shapes were fabricated with positive photoresist Novolak/DNQ using two-photon direct laser writing.

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Authors and Affiliations

  1. Faculty of Materials Science and Engineering, Kyoto Institute of Technology, Matsugasaki, Sakyo, Kyoto, 606-8585, Japan

    Naoto Tsutsumi, Kenji Kinashi & Wataru Sakai

  2. Department of Macromolecular Science and Engineering, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo, Kyoto, 606-8585, Japan

    Asato Fukuda

  3. Department of Materials and Life Science, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo, Kyoto, 606-8585, Japan

    Ryotaro Nakamura

Authors
  1. Naoto Tsutsumi
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  2. Asato Fukuda
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  3. Ryotaro Nakamura
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  4. Kenji Kinashi
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  5. Wataru Sakai
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Correspondence to Naoto Tsutsumi.

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Tsutsumi, N., Fukuda, A., Nakamura, R. et al. Fabrication of three-dimensional microstructures in positive photoresist through two-photon direct laser writing. Appl. Phys. A 123, 553 (2017). https://doi.org/10.1007/s00339-017-1170-4

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  • DOI: https://doi.org/10.1007/s00339-017-1170-4

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