Abstract
The degree of aromaticity of toluene plasma polymer is shown to decrease with decreasing toluene flow rate into the plasma (constant rf power). Optical emission spectroscopy (OES) of the plasma is predictive; a plasma emitting a higher relative benzyl radical signal results in the deposition of a more aromatic plasma polymer. Such results have been earlier reported in the literature. However, in this work the geometry of OES observation assured that only plasma emissions from the vicinity of the deposition site were observed. Under these conditions it is found that plasma pressure must be kept constant for the predictive nature of OES results to hold.
Similar content being viewed by others
References
B. J. Curtis and H. J. Brunner,J. Electrochem. Soc.: Solid-State Sci. Technol. 829 (1978).
R. d'Agostino, F. Cramarossa, and S. De Benedictis,Plasma Chem. Plasma Proc. 2, 213 (1982).
L. M. Buchmann, F. Heinrich, P. Hoffmann, and J. Janes,J. Appl. Phys. 67 (8), 3635 (1990).
R. d'Agostino, F. Cramarossa, and F. Illuzzi,J. Appl. Phys. 61(8), 2754 (1987).
R. d'Agostino, F. Cramarossa, V. Colaprico, and R. d'Ettole,J. Appl. Phys. 54 (3), 1284 (1983).
J. W. Coburn and M. Chen,J. Appl. Phys. 51, 3134 (1980).
R. d'Agostino, F. Cramarossa, S. De Benedictis, and G. Ferraro,J. Appl. Phys. 52, 1259 (1981).
R. d'Agostino, F. Cramarossa, F. Fracassi, and F. Illuzzi,J. Appl. Polym. Sci.: Appl. Polym. Symp. 46, 17 (1990).
M. M. Millard and E. Kay,J. Electrochem. Soc.: Solid-State Sci. Technol. 129, 160 (1982).
J. W. Coburn and M. Chen,J. Vac. Sci. Technol. 18, 353 (1981).
K. W. Bieg,Thin Solid Films 84, 411 (1981).
H. Yasuda and C. R. Wang,J. Polym. Sci., Polym. Chem. Ed. 23, 313 (1985).
R. d'Agostino, F. Cramarossa, F. Fracassi, and F. Illuzzi, inPlasma Deposition, Treatment and Etching of Polymer Films, R. d'Agostino, ed., Academic Press, Boston (1990).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Shih, W.S., Morosoff, N.C. Hydrocarbon plasma emission as a means to monitor plasma polymerization, revisited. Plasma Pol 1, 17–26 (1996). https://doi.org/10.1007/BF02532812
Received:
Revised:
Issue Date:
DOI: https://doi.org/10.1007/BF02532812