Synonyms
Chemical-assisted ion beam etching – CAIBE; Chemical vapor machining – CVM; Ion beam etching – IBE; Ion beam figuring – IBF; Ion beam smoothing – IBS; Plasma-assisted chemical etching – PACE; Plasma jet machining – PJM; Rapid atomic processing – RAP; Reactive ion beam etching – RIBE; Surface figuring; Surface patterning; Ultra-precision finishing; Ultra-precision machining
Definition
Ultra-precision surfaces and structures with nanometer accuracy comprise surface shapes and/or surface structures with the highest achievable processing accuracy of nanometer or even picometer rms range. Root mean square (rms) is a value calculated from differences of the surface measuring data and the desired (designed) surface shape data. Its value is a measure of how far on average the error is from zero. The ultimate accuracy of surface shapes and structures is a prerequisite for their physical functioning in many of today’s fields of science, technology, and products like electronics,...
References
Taniguchi, N.: On the basic concept of 'nano-technology. Proceedings of the International Conference on Production Engineering, p. 18. Japan Society of Precision Engineering, Tokyo, Part II (1974)
Taniguchi, N. (ed.): Nanotechnology: Integrated Processing Systems for Ultra-Precision and Ultra-Fine Products. Oxford University Press, Oxford (1996)
Stowers, I. F., Komanduri, R., Baird, E. D.: Review of precision surface generating processes and their potential application to the fabrication of large optical components, Proc. SPIE 0966, Advances in Fabrication and Metrology for Optics and Large Optics, 62 (1989); doi:10.1117/12.948050; http://dx.doi.org/10.1117/12.948050
Jacobs, S.D.: International innovations in optical finishing. Proc. SPIE 5533, 264 (2004)
Allen, D.M., Shore, P., Evans, R.W., Fanara, C., O’Brien, W., Marson, S., O’Neill, W.: Ion beam, focused ion beam, and plasma discharge machining. CIRP Ann. Manuf. Technol. 58(2), 647–662 (2009). doi:10.1016/j.cirp.2009.09.007
Brinksmeier, E.: Ultraprecision machining. In: Laperrière, L.., Reinhart, G. (eds.) CIRP Encyclopedia of Production Engineering: SpringerReference (www.springerreference.com). Springer, Berlin/Heidelberg (2013)
Shore, P., Morantz, P.: Ultra-precision: enabling our future. Philos. Trans. R. Soc. A Math. Phys. Eng. Sci. 370(1973), 3993–4014 (2012). doi:10.1098/rsta.2011.0638
Fang, F., Xu, Z.: State-of-the-Art for nanomanufacturing using ion beam technology. In: Nee, A. (ed.) Handbook of Manufacturing Engineering and Technology: SpringerReference (www.springerreference.com). Springer, Berlin/Heidelberg (2013)
Li, W., Gu, C.: Ion beam instruments used for nanomanufacturing. In: Nee, A. (ed.) Handbook of Manufacturing Engineering and Technology: SpringerReference (www.springerreference.com). Springer, Berlin/Heidelberg (2013)
Xu, Z., Fang, F., Zeng, G.: Focused ion beam nanofabrication technology. In: Nee, A. (ed.) Handbook of Manufacturing Engineering and Technology: SpringerReference (www.springerreference.com). Springer, Berlin/Heidelberg (2013)
Taylor, John S., Sommargren, Gary E., Sweeney, Donald W., Hudyma, Russell M.: Fabrication and testing of optics for EUV projection lithography, Proc. SPIE 3331, Emerging Lithographic Technologies II, 580 (1998); doi:10.1117/12.309619; http://dx.doi.org/10.1117/12.309619
Dinger, U., Seitz, G., Schulte, S., Eisert, F., Muenster, Ch., Burkart, S.S. et al.: Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography. In: Ali, M., Khounsary, A.M., Dinger, U., Ota, K. (eds.) Proceedings of SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, pp. 18–28. (2004). doi:10.1117/12.511489
Hansen, H.N., Carneiro, K., Haitjema, H., De Chiffre, L.: Dimensional micro and nano metrology. CIRP Ann. Manuf. Technol. 55(2), 721–743 (2006). doi:10.1016/j.cirp.2006.10.005
Leach, R. (ed.): Optical Measurement of Surface Topography. Springer, Berlin/Heidelberg. (2011). doi:10.1007/978-3-642-12012-1
Xu, C., Aissaoui, I., Jacquey, S.: Algebraic analysis of the Van Cittert iterative method of deconvolution with a general relaxation factor. J. Opt. Soc. Am. A 11(11), 2804 (1994). doi:10.1364/JOSAA.11.002804. https://en.wikipedia.org/wiki/Richardson%E2%80%93Lucy_deconvolution; https://en.wikipedia.org/wiki/Wiener_deconvolution
Xie, X., Li, S.: Ion beam figuring technology. In: Nee, A. (ed.) Handbook of Manufacturing Engineering and Technology: SpringerReference (www.springerreference.com). Springer, Berlin/Heidelberg (2013)
Baglin, J.E.E.: Ion beam nanoscale fabrication and lithography – a review. Appl. Surf. Sci. 258(9), 4103–4111 (2012). doi:10.1016/j.apsusc.2011.11.074
Johnson, L.F., Ingersoll, K.A.: Appl. Opt. 22, 1165 (1983). doi:10.1364/AO.22.001165
Frost, F., Ziberi, B., Schindler, A., Bigl, F.: Surface engineering with ion beams: from self-organized nanostructures to ultra-smooth surfaces. Appl. Phys. A 91: Mater. Sci. Process. 551(2008). doi:10.1007/s00339-008-4516-0
Arnold, T., Boehm, G., Fechner, R., Meister, J., Nickel, A., Frost, F., Haensel, T., Schindler, A.: Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook. Nucl. Inst. Methods Phys. Res. Sect. A 616(2–3), 147–156 (2010). doi:10.1016/j.nima.2009.11.013
Frost, F., Fechner, R., Ziberi, B., Voellner, J., Flamm, D., Schindle, A.: Large area smoothing of surfaces by ion bombardment: fundamentals and applications. J. Phys. Condens. Matter 21(22) (2009). doi:10.1088/0953-8984/21/22/224026
Yamada, I.: Historical milestones and future prospects of cluster ion beam technology. Appl. Surf. Sci. 310, 77–88 (2014). doi:10.1016/j.apsusc.2014.03.147
Laermer, F., Franssila, S., Sainiemi, L., Kolari, K.: Deep reactive Ion etching. In: Handbook of Silicon Based MEMS Materials and Technologies, pp. 349–374. Elsevier (2010). http://linkinghub.elsevier.com/retrieve/pii/B9780815515944000231
Vawter, G.A.: Ion beam etching of compound semiconductors. In: Shul, R.J., Pearton, S.J. (eds.) Handbook of Advanced Plasma Processing Techniques, p. 507 ff. Springer Science & Business Media (2000)
Bollinger, L.D., Zarowin, Ch.B.: Rapid, nonmechanical, damage-free figuring of optical surfaces using plasma-assisted chemical etching (PACE): part I experimental results. In: Arnold, J.B., Parks, R.E. (eds.)Proceedings of SPIE, Advances in Fabrication and Metrology for Optics and Large Optics, vol. 966, pp. 82–90. (1989). doi:10.1117/12.948052
Arnold, T., Böhm, G., Paetzelt, H.: Ultra-precision surface machining with reactive plasma jets. Contrib. Plasma Phys. 54(2), 145–154 (2014). doi:10.1002/ctpp.201310058
Meister, J., Arnold, T.: New process simulation procedure for high-rate plasma jet machining. Plasma Chem. Plasma Process 31, 91–107 (2011)
Arnold, Th., Böhm, G., Paetzelt, H.: Plasma jet polishing of rough fused silica surfaces. In: Conference Proceedings of the 13th International Conference of the EUSPEN V2, pp. 19–22 (2013)
Liao, W., Dai, Y., Xie, X., Zhou, L.: Combined figuring technology for high-precision optical surfaces using a deterministic ion beam material adding and removal method. Opt. Eng. 52(1), 010503 (2013). doi:10.1117/1.OE.52.1.010503
Yamamura, K., Sano, Y.: Plasma-based nanomanufacturing under atmospheric pressure. In: Nee, A. (ed.) Handbook of Manufacturing Engineering and Technology: SpringerReference (www.springerreference.com). Springer, Berlin/Heidelberg (2013)
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Arnold, T., Franz, T., Frost, F., Schindler, A. (2015). Ultra-precision Surfaces and Structures with Nanometer Accuracy by Ion Beam and Plasma Jet Technologies. In: Bhushan, B. (eds) Encyclopedia of Nanotechnology. Springer, Dordrecht. https://doi.org/10.1007/978-94-007-6178-0_100926-1
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