Volume 389, Issue 1 | MRS Online Proceedings Library

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Volume 389, Issue 1

December 1995

Symposium R — Modedling and Simulation of Thin-Film Processing

Issue Editors:

M. J. Fluss,
R. J. Kee,
D. Srolovitz,
C. A. Volkert

51 articles in this issue

Properties of Point-Defects in Si for Process Modeling
H. J. Gossmann
C. S. Rafferty
M. O. Thompson
OriginalPaper 15 February 2011 Pages: 3 - 14
Density-Functional Based MD Studies of Low-Energy Atom Collisions onto Diamond and Graphite
S. Uhlmann
U. Stephan
G. Seifert
OriginalPaper 15 February 2011 Pages: 15 - 21
Parameters for Feature Evolution Models in Plasma Etching from Molecular Dynamics Simulation
B. A. Helmer
D. B. Graves
M. E. Barone
OriginalPaper 15 February 2011 Pages: 23 - 28
Site Balance Models in Plasma Processing: A Comparison to Molecular Dynamics Simulations
M. E. Barone
D. B. Graves
OriginalPaper 15 February 2011 Pages: 29 - 34
Silicon AD-Dimer Binding on Si(100)
Peter J. Bedrossian
Arthur P. Smith
Hannes Jonsson
OriginalPaper 15 February 2011 Pages: 35 - 39
Simulation of Alkali Migration in β′′-Alumina Under Ion Bombardment
Paulo C. T. D’Ajello
André A. Pasa
OriginalPaper 15 February 2011 Pages: 41 - 46
Fundamental Mechanisms for Hg Vacancy and Interstitial Modeling in Mercury Cadmium Telluride
S. L. Holander
H. G. Robinson
C. R. Helms
OriginalPaper 15 February 2011 Pages: 47 - 52
Carbon Atom, Dimer and Trimer Chemistry on Diamond Surfaces from Molecular Dynamics Simulations
Steven M. Valone
OriginalPaper 15 February 2011 Pages: 53 - 58
Simulation of Multicomponent Thin Film Deposition and Growth
C. P. Burmester
L. T. Wille
R. Gronsky
OriginalPaper 15 February 2011 Pages: 59 - 64
Experimental Results and Modeling of the Codiffusion of Donors and Acceptors in Si
S. Solmi
S. Valmorri
OriginalPaper 15 February 2011 Pages: 65 - 70
Point Defect-Based Modeling of Transient Diffusion of Boron Implanted in Silicon Along Random and Channeling Directions
H. U. Jäger
OriginalPaper 15 February 2011 Pages: 71 - 76
A New Local Electronic Stopping Model for the Monte Carlo Simulation of Arsenic Ion Implantation into (100) Single-Crystal Silicon
S. H. Yang
S. Morris
J. Joannopoulos
OriginalPaper 15 February 2011 Pages: 77 - 82
Analytical and Numerical Modeling of Surface Morphologies in Thin Films
François Y. Genin
OriginalPaper 15 February 2011 Pages: 83 - 94
Conformality and Composition of Films Deposited at Low Pressures
Timothy S. Cale
OriginalPaper 15 February 2011 Pages: 95 - 106
The Effect of Grain Boundaries on Surface Diffusion Mediated-Planarization of Polycrystalline Cu Films
R. A. Brain
D. S. Gardner
H. A. Atwater
OriginalPaper 15 February 2011 Pages: 107 - 112
Surface-Topography Simulations of Ionized Sputter Metal Deposition
S. Hamaguchi
S. M. Rossnagel
OriginalPaper 15 February 2011 Pages: 113 - 117
Deposition Profile Simulation: Topological Effects
Yun Biao Wang
Francis Teyssandier
OriginalPaper 15 February 2011 Pages: 119 - 124
Simulation of Film Growth Contour in a Narrow Deep Trench and Film Crystallinity in LPCVD Process
Gyeong Soon Hwang
Chee Burm Shin
Sang Heup Moon
OriginalPaper 15 February 2011 Pages: 125 - 130
A Process Model for Thin Film Deposition by Sputtering: Study for Bottom Coverage of Sub-Micron Contact Holes
C. C. Fang
V. Prasad
OriginalPaper 15 February 2011 Pages: 131 - 136
A Model for Texture Evolution in a Growing Film
G. Knuyt
C. Quaeyhaegens
L. M. Stals
OriginalPaper 15 February 2011 Pages: 137 - 142
Mechanisms of Grain Growth in Bubble-Fence-Delineated Films
S. J. Townsend
H. J. Frost
C. S. Nichols
OriginalPaper 15 February 2011 Pages: 143 - 148
Elastic Analysis of Twinning in Misfitting Thin Films
N. Sridhar
J. M. Rickman
D. J. SroIovitz
OriginalPaper 15 February 2011 Pages: 149 - 154
Void Formation in Thin Semiconducting Film Under Ion Implantation
V. A. Zhikharev
F. R. Batyrshin
OriginalPaper 15 February 2011 Pages: 155 - 159
Evaluation of Anisotropic Film Structure of Amorphous Alloy by Computer Simulation
A. Sato
H. Yamamoto
OriginalPaper 15 February 2011 Pages: 161 - 166
Simulation of the Nucleation and Growth of Si Grains Inside Au Thin Films
A. A. Pasa
M. Neugebauer
G. H. Bauer
OriginalPaper 15 February 2011 Pages: 167 - 172
Simulation Studies of TiN PVD and CVD Thin Films for Contact/Via Liners
D. S. Bang
J. P. McVittie
K. A. Littau
OriginalPaper 15 February 2011 Pages: 173 - 179
Molecular Dynamics Simulation of Mechanical Deformation of Ultra-Thin Metal and Ceramic Films
J. Belak
J. N. Glosli
I. F. Stowers
OriginalPaper 15 February 2011 Pages: 181 - 190
A Model for Estimating the Stress Induced During Oxidation of Sharp Silicon Structures
C. J. Morgan
C. J. Humphreys
OriginalPaper 15 February 2011 Pages: 191 - 196
Modeling of Aspect Ratio Dependent Etching in an Inductively Coupled Plasma
J. S. Han
J. P. McVittie
OriginalPaper 15 February 2011 Pages: 197 - 207
Monte Carlo Simulation of Dislocation-Nucleated Etching of Silicon {111} Surfaces
Donald L. Woodraska
Jason Lacosse
John A. Jaszczak
OriginalPaper 15 February 2011 Pages: 209 - 214
Modeling and Computer Simulation of the Thermal Field Induced by Ion Beam Irradiation of Bilayers
Tosto Sebastiano
OriginalPaper 15 February 2011 Pages: 215 - 220
Comparison of Damage Accumulation Models for Boron Implantation in Silicon
A. Simionescu
G. Hobler
OriginalPaper 15 February 2011 Pages: 221 - 226
Dynamic Simulation of Ultra-Shallow Implantation Profiles in Single-Crystalline Silicon
Matthias Posselt
OriginalPaper 15 February 2011 Pages: 227 - 232
Theoretical Investigation of Implanted Dopant Diffusion From a Silicide Layer to the Silicon Wafer for Ultra Shallow P-N Junction Formation
M. Sinder
J. Pelleg
OriginalPaper 15 February 2011 Pages: 233 - 239
Computational Simulation of Photoluminescence and Reflectivity Spectra of a Strained Layer Superlattice
M. Di Blasio
M. Averous
OriginalPaper 15 February 2011 Pages: 241 - 256
Characterization of Quantum Heterostructures. A Simulation Method Combining the Evaluation of Lattice and Electrons Configuration and TEM Imaging.
G. Mattei
A. M. Mazzone
OriginalPaper 15 February 2011 Pages: 257 - 262
The Effects of Collimator Life Time on the Ti and Tin Film Growth Rates and Conformalities in Sputter Deposition Processes: Experiments and Simulations
Hung Liao
Hannes Stippel
Timothy Cale
OriginalPaper 15 February 2011 Pages: 263 - 268
Modeling, Simulation and Control of Single Wafer Process in Cluster Tool Base on FT-IR In-Lin Sensor
Shaohua Liu
Peter Solomon
N. M. Ravindra
OriginalPaper 15 February 2011 Pages: 269 - 274
Optimization of Process Parameter and Temperature Uniformity on Wafers for Rapid Thermal Processing
Andreas Tillmann
OriginalPaper 15 February 2011 Pages: 275 - 286
Transient and Spatial Radiative Properties of Patterned Wafers during Rapid Thermal Processing
Peter Y. Wong
Ioannis N. Miaoulis
Cynthia G. Madras
OriginalPaper 15 February 2011 Pages: 287 - 292
The Potential Effect of Multilayer Patterns on Temperature Uniformity During Rapid Thermal Processing
Jeffrey P. Hebb
Klavs F. Jensen
Erik W. Egan
OriginalPaper 15 February 2011 Pages: 293 - 299
Emissivity of Rough Silicon Surfaces: Measurement and Calculations
H. Xu
J. C. Sturm
OriginalPaper 15 February 2011 Pages: 301 - 306
A New Flexible Rapid Thermal Processing System
K. C. Saraswat
Y. Chen
B. T. Khuri-Yakub
OriginalPaper 15 February 2011 Pages: 307 - 319
In-Situ Resistance Measurements During Rapid Thermal Annealing for Process Characterization
E. G. Colgan
C. Cabral Jr.
J. M. E. Harper
OriginalPaper 15 February 2011 Pages: 321 - 326
An Analytic Approach to the Radiation Fields of Tubular Halogen Lamp Arrangements in RTP Reactor Blocks
Thomas Theiler
OriginalPaper 15 February 2011 Pages: 327 - 332
Application of a Neural Manufacturing Concept to Process Modeling, Monitoring and Control
Chi Yung Fu
Loren Petrich
Benjamin Law
OriginalPaper 15 February 2011 Pages: 333 - 338
Design-Coupled Manufacturing
Zachary J. Lemnios
OriginalPaper 15 February 2011 Pages: 339 - 346
Concurrent Design of an RTP Chamber and Advanced Control System
Paul Spenc
Charles Schaper
Ahmad Kermant
OriginalPaper 15 February 2011 Pages: 347 - 358
Monte-Carlo simulation of the deposition process in PVD-technoIogy
E. Lugscheider
O. Knotek
P. Eckert
OriginalPaper 15 February 2011 Pages: 359 - 365
1D and 2D Monte Carlo Simulations of Pulsed Laser Ablation of Si/Ga Into Ar/O₂ with a Substrate
D. L. Capewell
D. G. Goodwin
OriginalPaper 15 February 2011 Pages: 367 - 372