1. Electrically Coupling Multifunctional Oxides to Semiconductors: A Route to Novel Material Functionalities

   • J. H. Ngai
   • K. Ahmadi-Majlan
   • D. Su

   OriginalPaper 04 February 2016 Pages: 255 - 263

2. Impact of glycerol on Zinc Oxide based thin film transistors with Indium Molybdenum Oxide electrodes

   • Mateusz Tomasz Mądzik
   • Elangovan Elamurugu
   • Jaime Viegas

   OriginalPaper 13 January 2016 Pages: 265 - 268

3. Higher-k Tetragonal Phase Stabilization in Atomic Layer Deposited Hf_1-xZr_xO₂ (0<x<1) Thin Films on Al₂O₃ Passivated Epitaxial-Ge

   • Sonal Dey
   • Kandabara Tapily
   • Alain C. Diebold

   OriginalPaper 26 January 2016 Pages: 269 - 274

4. Memristive behavior in BaTiO₃/La_0.7Sr_0.3MnO₃ heterostructures integrated with semiconductors

   • Srinivasa Rao Singamaneni
   • John Prater
   • Jay Narayan

   OriginalPaper 26 January 2016 Pages: 275 - 280

5. Thin-film transistors based on Zinc Oxide channel layer and Molybdenum doped Indium Oxide transparent electrodes

   • Mateusz Tomasz Mądzik
   • Elangovan Elamurugu
   • Jaime Viegas

   OriginalPaper 26 January 2016 Pages: 281 - 285

6. Integrating 2D electron gas oxide heterostructures on silicon using rare-earth titanates

   • Eric N. Jin
   • Lior Kornblum
   • Frederick J. Walker

   OriginalPaper 02 February 2016 Pages: 287 - 292

7. Effect of UV Laser Irradiation on the properties of NiO films and ZnO/NiO Heterostructures

   • Srikanth Itapu
   • Kamruzzaman Khan
   • Daniel G. Georgiev

   OriginalPaper 03 February 2016 Pages: 293 - 298

8. Pulsed-Metal Organic Chemical Vapor Deposition (PMOCVD) for Growth of Single Phase Wurtzite Mg_xZn_1-xO Epitaxial Film with High Mg Content (x=0.51)

   • Fikadu Alema
   • Oleg Ledyaev
   • Winston V. Schoenfeld

   OriginalPaper 15 February 2016 Pages: 299 - 304

9. All inorganic quantum dot light emitting devices with solution processed metal oxide transport layers

   • R. Vasan
   • H. Salman
   • M. O. Manasreh

   OriginalPaper 15 February 2016 Pages: 305 - 310

10. Growth of HfSi_xO_y/ HfO₂ Thin Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Techniques

    • Hiroki Ishizaki

    OriginalPaper 22 February 2016 Pages: 311 - 316