1. Plasma and Ion-Beam Assisted Materials Processing

   • Jose L. Endrino
   • André Anders
   • Mykola Vinnichenko

   OriginalPaper 01 March 2012 Pages: 741 - 742

2. A review of monolithic and multilayer coatings within the boron–carbon–nitrogen system by ion-beam-assisted deposition

   • Ignacio Jiménez
   • Ricardo Torres
   • Jose María Albella

   OriginalPaper 01 March 2012 Pages: 743 - 764

   

3. Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment

   • Klaus Ellmer
   • Thomas Welzel

   OriginalPaper 01 March 2012 Pages: 765 - 779

   

4. An introduction to thin film processing using high-power impulse magnetron sputtering

   • Daniel Lundin
   • Kostas Sarakinos

   OriginalPaper 01 March 2012 Pages: 780 - 792

   

5. An approach to the three-dimensional simulations of the Bosch process

   • Branislav Radjenović
   • Marija Radmilović-Radjenović

   OriginalPaper 01 March 2012 Pages: 793 - 798

   

6. Modeling evaporation, ion-beam assist, and magnetron sputtering of TiO₂ thin films over realistic timescales

   • Sabrina Blackwell
   • Roger Smith
   • John M. Walls

   OriginalPaper 01 March 2012 Pages: 799 - 805

   

7. Surface irradiation and materials processing using polyatomic cluster ion beams

   • Gikan H. Takaoka
   • Hiromichi Ryuto
   • Mitsuaki Takeuchi

   OriginalPaper 01 March 2012 Pages: 806 - 821

   

8. Thick beryllium coatings by ion-assisted magnetron sputtering

   • Hongwei Xu
   • Craig Alford
   • Kelly P. Youngblood

   OriginalPaper 01 March 2012 Pages: 822 - 828

   

9. Thermal decomposition and fractal properties of sputter-deposited platinum oxide thin films

   • Adolfo Mosquera
   • David Horwat
   • Jose L. Endrino

   OriginalPaper 01 March 2012 Pages: 829 - 836

   

10. Residual stress in as-deposited Al–Cu–Fe–B quasicrystalline thin films

    • Sergey Polishchuk
    • Pascal Boulet
    • Vincent Fournée

    OriginalPaper 01 March 2012 Pages: 837 - 844

    

11. Properties of hydrogenated DLC films as prepared by a combined method of plasma source ion implantation and unbalanced magnetron sputtering

    • Stefan Flege
    • Ruriko Hatada
    • Koumei Baba

    OriginalPaper 01 March 2012 Pages: 845 - 849

    

12. Structural and tribological characterization of Ti–In–N films deposited by magnetron sputter deposition

    • Margaret A. Nowicki
    • James E. Krzanowski
    • Jose L. Endrino

    OriginalPaper 01 March 2012 Pages: 850 - 856

    

13. Improved structural and electrical properties of thin ZnO:Al films by dc filtered cathodic arc deposition

    • Yuankun Zhu
    • Rueben J. Mendelsberg
    • André Anders

    OriginalPaper 01 March 2012 Pages: 857 - 862

    

14. Pulsed plasmas study of linear antennas microwave CVD system for nanocrystalline diamond film growth

    • Jan Vlcek
    • Frantisek Fendrych
    • Michael Liehr

    OriginalPaper 01 March 2012 Pages: 863 - 867