1. Application of the Tikhonov Regularization Method in Problems of Ellipsometic Porometry of Low-K Dielectrics

   • R. A. Gaidukasov
   • A. V. Myakon’kikh
   • K. V. Rudenko

   OriginalPaper Open access 12 July 2022 Pages: 199 - 209

   

2. Application of the Methods Used to Interpret the Electron Spectroscopy Spectra to Interpret Ion Spectroscopy Signals

   • V. P. Afanasiev
   • L. G. Lobanova

   OriginalPaper 12 July 2022 Pages: 210 - 219

   

3. Modeling Silicon Cylindrical CMOS Nanotransistors with a Fully Enclosed Variable-Radius Gate

   • N. V. Masalsky

   OriginalPaper 12 July 2022 Pages: 220 - 225

   

4. Finite Element Modeling of Surface Acoustic Wave Devices Using COMSOL

   • A. S. Koigerov
   • A. V. Korlyakov

   OriginalPaper 12 July 2022 Pages: 226 - 235

   

5. Formation of Nanosized Structures on the Silicon Surface by a Combination of Focused Ion Beam Methods and Plasma-Chemical Etching

   • V. S. Klimin
   • Yu. V. Morozova
   • O. A. Ageev

   OriginalPaper 12 July 2022 Pages: 236 - 242

   

6. Plasma-Chemical and Reactive-Ion Etching of Silicon in Tetrafluoromethane with Argon

   • D. B. Murin
   • S. A. Pivovarenok
   • A. S. Kozin

   OriginalPaper 12 July 2022 Pages: 243 - 246

   

7. Plasma Parameters and Kinetics of Reactive-Ion Etching of Silicon in a C₆F₁₂O + Ar Mixture

   • A. M. Efremov
   • V. B. Betelin
   • K.-H. Kwon

   OriginalPaper 12 July 2022 Pages: 247 - 254

   

8. A Mechanism for the Formation of a Conducting Medium in Memristers Based on Electroformed Open Sandwich MDM Structures

   • V. M. Mordvintsev
   • E. S. Gorlachev
   • S. E. Kudryavtsev

   OriginalPaper 12 July 2022 Pages: 255 - 263

   

9. Analysis of the Effects Influencing the Retention Time of Filament-Based Memristors

   • A. V. Fadeev
   • K. V. Rudenko

   OriginalPaper 12 July 2022 Pages: 264 - 272