Quantum calculations on quantum dots in semiconductor microcavities. Part III A. V. TsukanovI. Yu. Kateev OriginalPaper 04 March 2015 Pages: 61 - 78
Anisotropic trench etching of silicon with high aspect ratio and aperture of 30–50 nm in a two-stage plasma-chemical cyclic process S. N. AverkinV. F. LukichevI. A. Tyurin OriginalPaper 04 March 2015 Pages: 79 - 88
A tunnel field-effect transistor with a graphene derivatives (COH) n -(CF) n -(CH) n three-layer quantum well with the middle (CF) n drain layer V. A. ZhukovV. G. Maslov OriginalPaper 04 March 2015 Pages: 89 - 100
Investigation of magnetotransistors with new topology A. Yu. KrasyukovR. D. TikhonovA. V. Kozlov OriginalPaper 04 March 2015 Pages: 101 - 113
Two-dimensional thermal oxidation of nonplanar silicon surfaces S. V. KalininA. V. Egorkin OriginalPaper 04 March 2015 Pages: 114 - 126
Micropower preamplifier for comparators of precision ADCs D. L. Osipov OriginalPaper 04 March 2015 Pages: 127 - 131
Effect of test object slope on SEM calibration Yu. A. Novikov OriginalPaper 04 March 2015 Pages: 132 - 138