1. Depth profiles of refractive index in thermally grown and LPCVD oxide films on silicon

   • B. M. Ayupov
   • S. F. Devyatova
   • L. A. Semenova

   Materials Characterization 27 May 2008 Pages: 141 - 145

2. Electron-beam-induced modification of PbSnTe surface morphology under HEED monitoring of MBE growth

   • L. A. Borynyak
   • A. A. Velichko
   • N. I. Filimonova

   Materials Characterization 27 May 2008 Pages: 146 - 156

3. Response of the electron plasma in a thin metal slab to a low-frequency external electric field

   • A. V. Latyshev
   • A. A. Yushkanov

   Materials Characterization 27 May 2008 Pages: 157 - 165

4. New CMOS process using a thermal-oxide mask for making n ⁻- and p ⁻-Wells

   • Yu. P. Snitovsky
   • M. G. Krasikov

   Solid-State Devices 27 May 2008 Pages: 166 - 174

5. Submicrometer- and nanometer-structure formation on the surface of epitaxial IV–VI semiconductor films by Ar-plasma treatment

   • S. P. Zimin
   • E. S. Gorlachev
   • M. N. Gerke

   Micro- and Nanofabrication Technologies 27 May 2008 Pages: 175 - 186

6. Improved multistep method of ion implantation into silicon for IC manufacture

   • V. I. Plebanovich
   • A. R. Chelyadinskii
   • V. E. Osipov

   Micro- and Nanofabrication Technologies 27 May 2008 Pages: 187 - 191

7. IC performance degradation: Simulation and forecasting

   • A. V. Strogonov

   IC Reliability 27 May 2008 Pages: 192 - 200

8. New experiments on iterative synthesis of combinational circuits

   • P. N. Bibilo
   • V. I. Romanov

   Circuits and Systems 27 May 2008 Pages: 201 - 212