Depth profiles of refractive index in thermally grown and LPCVD oxide films on silicon B. M. AyupovS. F. DevyatovaL. A. Semenova Materials Characterization 27 May 2008 Pages: 141 - 145
Electron-beam-induced modification of PbSnTe surface morphology under HEED monitoring of MBE growth L. A. BorynyakA. A. VelichkoN. I. Filimonova Materials Characterization 27 May 2008 Pages: 146 - 156
Response of the electron plasma in a thin metal slab to a low-frequency external electric field A. V. LatyshevA. A. Yushkanov Materials Characterization 27 May 2008 Pages: 157 - 165
New CMOS process using a thermal-oxide mask for making n −- and p −-Wells Yu. P. SnitovskyM. G. Krasikov Solid-State Devices 27 May 2008 Pages: 166 - 174
Submicrometer- and nanometer-structure formation on the surface of epitaxial IV–VI semiconductor films by Ar-plasma treatment S. P. ZiminE. S. GorlachevM. N. Gerke Micro- and Nanofabrication Technologies 27 May 2008 Pages: 175 - 186
Improved multistep method of ion implantation into silicon for IC manufacture V. I. PlebanovichA. R. ChelyadinskiiV. E. Osipov Micro- and Nanofabrication Technologies 27 May 2008 Pages: 187 - 191
IC performance degradation: Simulation and forecasting A. V. Strogonov IC Reliability 27 May 2008 Pages: 192 - 200
New experiments on iterative synthesis of combinational circuits P. N. BibiloV. I. Romanov Circuits and Systems 27 May 2008 Pages: 201 - 212