Electrical behavior of modulation-and delta-doped Al x Ga1 − x As/In y Ga1 − y As/GaAs PHEMT structures G. B. GalievI. S. Vasil’evskiiV. G. Mokerov Micro-and Nanoelectronic Devices Pages: 67 - 73
Cold atoms in optical lattices as qubits for a quantum computer D. B. TretyakovI. I. BeterovI. I. Ryabtsev Micro-and Nanoelectronic Devices Pages: 74 - 77
Electroluminescence mechanisms in SiO x N y (Si) nanocomposite films V. G. BaruV. A. ZhitovE. A. Shteinman Materials and Microstructure Characterization Pages: 78 - 86
Progression of an excess-carrier pulse in Zn-compensated P-doped Si exposed to an electric field close to the recombination-wave threshold B. V. KornilovV. V. Privezentsev Materials and Microstructure Characterization Pages: 87 - 93
Influence of background impurities on the formation of stacking faults in silicon wafers D. I. BrinkevichV. S. ProsolovichA. N. Petlitskii Materials and Microstructure Characterization Pages: 94 - 97
Multiplex Fourier-transform spectroscopy in the characterization of stochastic inhomogeneous film growth: A conceptual framework V. A. Kotenev Materials and Microstructure Characterization Pages: 98 - 104
Reading sensitivity of a new thermomechanical data-storage technique: The effect of reducing probe dimensions A. B. Petrin Process Technologies Pages: 105 - 115
Inclusion-exclusion principle in the design of a BIST unit for LSI and VLSI circuits I. P. Kobyak Circuit Analysis and Synthesis Pages: 116 - 126
Transient analysis of RC on-chip transmission lines with respect to propagation speed V. B. Fyodorov Circuit Analysis and Synthesis Pages: 127 - 136