Abstract
A conceptual framework is discussed of multiplex Fourier-transform optical noise spectroscopy as applied to the characterization of laterally inhomogeneous stochastic processes associated with film growth. A Fourier-transform relationship is revealed between reflected-intensity noise spectrum and the distributions of surface centers in growth time, size, growth rate, etc. This finding suggests an application of multiplex Fouriertransform spectroscopy to the characterization of growing films by random reflection of laser radiation. The technique developed could be useful for the in situ monitoring of process spread in etching.
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Original Russian Text © V.A. Kotenev, 2006, published in Mikroelektronika, 2006, Vol. 35, No. 2, pp. 117–125.
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Kotenev, V.A. Multiplex Fourier-transform spectroscopy in the characterization of stochastic inhomogeneous film growth: A conceptual framework. Russ Microelectron 35, 98–104 (2006). https://doi.org/10.1134/S1063739706020065
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DOI: https://doi.org/10.1134/S1063739706020065