Residual-Photoresist Removal from Si and GaAs Surfaces by Atomic-Hydrogen Flow Treatment E. V. AnishchenkoV. A. KagadeiS. V. Romanenko Process Technologies Pages: 131 - 139
Electrical Behavior of In Situ Doped Polysilicon Films as Influenced by the Dopants A. A. KovalevskiiV. E. BorisenkoA. V. Dolbik Thin Films Pages: 140 - 146
Making Anodic Alumina Thin Films Having a Pore Array A. I. VorobyovaE. A. Outkina Thin Films Pages: 147 - 154
Adjusting the Spectral Response of Silicon Photodiodes by Additional Dopant Implantation I. V. VanyushinV. A. Gergel’Yu. I. Tishin Micro- and Nanoelectronic Devices Pages: 155 - 159
Response Mechanism of the Base-in-Well Bipolar Magnetotransistor R. D. Tikhonov Micro- and Nanoelectronic Devices Pages: 160 - 172
Square-Membrane Deflection and Stress: Identifying the Validity Range of a Calculation Procedure V. A. GridchinV. V. GrichenkoV. M. Lubimsky Microelectromechanical Systems Pages: 173 - 180
Positron-Annihilation-Spectroscopy Study of Proton-Induced Defects in Silicon V. I. GrafutinO. V. IlyukhinaYu. V. Funtikov Silicon-Defect Spectroscopy Pages: 181 - 186
Transient Analysis of Subnanosecond Integrated ADCs A. MarcinkeviciusD. PoviliauskasV. Jasonis Circuit Analysis and Synthesis Pages: 187 - 201