Quartz crystal microbalance simulation of the directionality of Si etching in CF4 glow discharges Natasha C.UsR. W. SadowskiJ. W. Coburn OriginalPaper Pages: 1 - 10
Gas-phase reactions of CF3 and CF2 with atomic and molecular fluorine: Their significance in plasma etching I. C. PlumbK. R. Ryan OriginalPaper Pages: 11 - 25
Electric discharge-induced oxidation of hydrogen cyanide Mark E. FraserRonald S. Sheinson OriginalPaper Pages: 27 - 38
Kinetics and mechanism in the decomposition of NH3 in a radio-frequency pulse discharge John E. NicholasAndrew I. SpiersNicholas A. Martin OriginalPaper Pages: 39 - 51
Nitriding of niobium and tantalum with a plasma jet under reduced pressure Toshiro KotakiOsamu Matsumoto OriginalPaper Pages: 53 - 63
Calculation of thermodynamic properties and transport coefficients for SF6-N2 mixtures in the temperature range 1,000–30,000 K A. GleizesM. RazafinimananaS. Vacquie OriginalPaper Pages: 65 - 78
Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing M. ChakerM. MoisanZ. Zakrzewski OriginalPaper Pages: 79 - 96
Chemical processes in a plasma centrifuge S. V. KorobtsevT. A. KosinovaV. D. Rusanov OriginalPaper Pages: 97 - 107
