Volume 42, Issue 6 | Plasma Chemistry and Plasma Processing

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Volume 42, Issue 6

November 2022

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12 articles in this issue

Charging Effect in Basic and Complex Mask Patterns During Plasma Etching
Peng Zhang
Dengmei Li
Original Paper 03 August 2022 Pages: 1211 - 1222
Silica sputtering by noble gas projectiles: elucidating the effect of cluster species with molecular dynamic simulation
N. G. Korobeishchikov
P. V. Stishenko
V. V. Yakovlev
Original Paper 21 September 2022 Pages: 1223 - 1235
Study of the Electron Density in an Inductively Coupled Plasma of Fluorine-Hydrogen-Argon Gas Mixture
Sergey Sintsov
Dmitry Mansfeld
Alexander Vodopyanov
Original Paper 24 August 2022 Pages: 1237 - 1247
Efficient Corona Discharge Fog Collector: Multiple Mesh Electrodes with Electric Field Enhances Fog Harvesting
Dingchen Li
Chuan Li
Yuan Pan
Original Paper 24 August 2022 Pages: 1249 - 1264
Chemical Kinetics of C₅F₁₀O with Reactive ·OH Radical Induced in AOP in Gaseous and Aqueous Phases
Yuwei Fu
Santu Luo
Dingxin Liu
Original Paper 12 August 2022 Pages: 1265 - 1278
Cr(VI) Reduction by Microsecond Pin-to-Pin Discharges Generated in an Aqueous Solution
T. S. Nguyen
N. Fagnon
C. Rond
Original Paper 06 September 2022 Pages: 1279 - 1290
Rapid Inactivation of E. coli by Water Droplet-Tuned Surface Micro-Discharges
Xi Wang
Zhihua Qi
Dongping Liu
Original Paper 19 August 2022 Pages: 1291 - 1310
Investigation of Rotating Arc-Catalytic Reactor for CF₄ Removal with High Energy Efficiency
Sungkwon Jo
Donghyun Cho
Woo Seok Kang
Original Paper 22 July 2022 Pages: 1311 - 1327
Comparison Study of Two Atmospheric Pressure Plasma Jet Configurations for Plasma-Catalyst Development
Wameedh Adress
W. G. Graham
Original Paper 25 August 2022 Pages: 1329 - 1344
The Effect of the Process Parameters on the Composition and Properties of Silica-Like Films Deposited by Atmospheric Pressure PECVD in the System TEOS-He-O₂
Anastasia S. Bil
Sergey E. Alexandrov
Original Paper 23 September 2022 Pages: 1345 - 1360
Analysis of the Thermal Decomposition Path of SF₆ on the Surface of Cu and its Oxides
Fuping Zeng
Kexin Zhu
Ju Tang
Original Paper 30 July 2022 Pages: 1361 - 1380
Modeling of Thermogasdynamics and Thermal Processes of Volatile Halides of Elements of III, IV and VI Groups in Thermal Plasma of RF-IC Discharge at Atmospheric Pressure
L. V. Shabarova
R. A. Kornev
P. S. Kalyasov
Original Paper 12 August 2022 Pages: 1381 - 1403