Kinetics and mechanism of the decomposition of CS2, OCS, and SCl2 in a radiofrequency pulse discharge John E. NicholasChristopher A. Amodio OriginalPaper Pages: 331 - 339
Effect of frequency on the deposition of microcrystalline silicon from tetrachlorosilane in low-pressure r.f. plasmas E. GrossmanA. GrillR. Avni OriginalPaper Pages: 341 - 351
The quenching of vibrationally excited N 2 + ions by various neutrals W. DoblerF. HoworkaW. Lindinger OriginalPaper Pages: 353 - 359
Operating characteristics and energy distribution in transferred plasma arc systems H. K. ChoiW. H. Gauvin OriginalPaper Pages: 361 - 386
Kinetic modelling of the reduction of SiCl4 in an arc heater for the production of silicon J. F. CoudertE. BourdinP. Fauchais OriginalPaper Pages: 399 - 419