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Analytical Modeling of a Triple Material Double Gate TFET with Hetero-Dielectric Gate Stack

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Abstract

In this paper, we propose and develop an analytical model of a Triple material double gate Tunnel Field Effect Transistor (TM-DG TFET) with hetero-dielectric gate oxide stack comprising of SiO2 and HfO2. The two-dimensional Poisson’s equation has been solved using parabolic-approximation method to model the channel potential and electric field. Analytical model of drain current is developed by integrating the band-to-band tunneling generation rate over the channel thickness (tsi) and shortest tunneling path (\(L_{\min }\)). A Transconductance model is also developed using this drain current model. The proposed TM-DG TFET also provides better result with reference to input-output characteristics, subthreshold swing, ION/IOFF current ratio and ambipolar effect compared to the dual material double gate (DM-DG) TFET. The analytical model has been validated with the numerical data obtained from commercial TCAD software.

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Authors and Affiliations

  1. Department of Electronics and Communication Engineering, Motilal Nehru National Institute of Technology Allahabad, Allahabad, 211004, India

    Santosh Kumar Gupta & Satyaveer Kumar

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  1. Santosh Kumar Gupta
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  2. Satyaveer Kumar
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Correspondence to Santosh Kumar Gupta.

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Gupta, S.K., Kumar, S. Analytical Modeling of a Triple Material Double Gate TFET with Hetero-Dielectric Gate Stack. Silicon 11, 1355–1369 (2019). https://doi.org/10.1007/s12633-018-9932-y

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  • DOI: https://doi.org/10.1007/s12633-018-9932-y

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