Abstract
Hydroxymethyltriethoxysilane and hydroxymethyltrimethoxysilane, precursors by hydrolysis to a simple analog of silicic acid, hydroxymethylsilanetriol, were prepared. Hydroxymethyltrialkoxysilanes undergo condensation to form silmethyleneoxide oligomers and dimeric 2,2,5,5-tetraalkoxy-2,5-disila-1,4-dioxanes. Hydroxymethylsilanetriol undergoes condensation reactions similar to silicic acid and readily forms organosilicate structures by sol–gel processing techniques which may be converted at relatively low temperatures to silicon dioxide. Hydroxmethylsilanetriol derived gels were subject to less stress-cracking during drying than conventional tetraethoxysilane derived gels, suggesting that Si-O-C bond equilibration during drying provides a mechanism for stress-relief. In screening experiments, hydroxymethylsilanetriol appears to be a competitive inhibitor of the growth of the diatom C. fusiformis, a silicate dependent species, which produces silicate structures.
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Arkles, B., King, K. & Pannell, K. Hydroxymethylsilanetriol – A Simple Analog of Silicic Acid. Silicon 5, 187–197 (2013). https://doi.org/10.1007/s12633-013-9146-2
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DOI: https://doi.org/10.1007/s12633-013-9146-2