Abstract
Interdiffusion study is conducted in the V-Si system to determine integrated diffusion coefficients of the phases. Activation energy values are calculated from the experiments conducted at different temperatures. The average values are found to be 208, 240 and 141 kJ/mol, respectively, for the V3Si, V5Si3 and VSi2 phases. The low activation energy for the VSi2 phase indicates very high concentration of defects or the significant contribution from the grain boundary diffusion. The error in calculation of diffusion parameters from a very thin phase layer in a multiphase diffusion couple is discussed. Further the data available in the literature in this system is compared and the problems in the indirect methodology followed previously to calculate the diffusion parameters are discussed.
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References
J.J. Petrovic, R.E. Honnell, and W.S. Gibbs, Moly Disilicide Alloy Matrix Composites, U.S. Patent 4,970,179, 1990
A.D. Remenyuk and N.M. Schmidt, The Ohmic Contact to the Silicon Schottky Barrier Using Vanadium Silicide and Gold or Silver Metallization, Appl. Surf. Sci., 1995, 91, p 352-354
H.A.C.M. Bruning, Homogeneity Regions and Superconducting Transition Temperatures in the System V-V3Si, Philips Res. Rep., 1967, 22, p 349-354
C. Milanese, V. Buscaglia, F. Maglia, and U. Anselmi-Tamburini, Reactive Diffusion in the System Vanadium-Silicon, Acta Mater., 2002, 50, p 1393-1403
C. Wagner, The Evaluation of Data Obtained with Diffusion Couples of Binary Single-Phase and Multiphase Systems, Acta Met., 1969, 17, p 99-107
V. Buscaglia and U. Anselmi-Tamburini, On the Diffusional Growth of Compounds with Narrow Homogeneity Range in Multiphase Binary Systems, Acta Mater., 2002, 50, p 525-535
A.K. Kumar, T. Laurila, V. Vuorinen, and A. Paul, Determination of Diffusion Parameters and Activation Energy of Diffusion in V3Si Phase with A15 Crystal Structure, Scripta Mater., 2009, 60, p 377-380
P. Villars and L.D. Calvert, Pearson’s Handbook on Crystallographic Data for Intermetallic Phases, 2nd ed., ASM International, Materials Park, OH, 1991
A. Paul, M.J.H. van Dal, A.A. Kodentsov, and F.J.J. Van Loo, The Kirkendall Effect in Multiphase Diffusion, Acta Mater., 2004, 52, p 623-630
A. Paul, A.A. Kodentsov, and F.J.J. van Loo, Physico-Chemical Analysis of Compound Growth in a Diffusion Couple with Two-Phase End Members, Intermetallics, 2006, 14, p 1428-1432
C. Ghosh and A. Paul, A Physico-Chemical Approach in Binary Solid-State Interdiffusion, Acta Mater., 2007, 55, p 1927-1939
C. Matano, On the Relation between Diffusion Coefficients and Concentrations of Solid Metals, Jpn. J. Phys., 1933, 8, p 109-113
F.J.J. van Loo, Multiphase Diffusion in Binary and Ternary Solid-State Systems, Progr. Solid State Chem., 1990, 20, p 47-99
M.J.H. van Dal, D.G.G.M. Huibers, A.A. Kodentsov, and F.J.J. van Loo, Formation of Co-Si Intermetallics in Bulk Diffusion Copules. Part I. Growth Kinetics and Mobilities of Species in the Silicide Phases, Intermetallics, 2001, 9, p 409-421
P.C. Tortorici and M.A. Dayananda, Growth of Silicides and Interdiffusion in the Mo-Si System, Metall. Mater. Trans. A, 1999, 30A, p 545-550
S. Prasad and A. Paul, Growth Mechanism of Phases by Interdiffusion and Diffusion of Species in the Nb-Si System, Acta Mater. 2011, 59, p 1577.
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A. Paul would like to acknowledge the financial support received from CSIR and DRDO India.
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Prasad, S., Paul, A. Reactive Diffusion Between Vanadium and Silicon. J. Phase Equilib. Diffus. 32, 212–218 (2011). https://doi.org/10.1007/s11669-011-9874-1
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DOI: https://doi.org/10.1007/s11669-011-9874-1