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Titanium Oxide Adhesion Layer for High Temperature Annealed Si/Si3N4/TiO x /Pt/LiCoO2 Battery Structures

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Abstract

This work describes the influence of a high annealing temperature of about 700°C on the Si(substrate)/Si3N4/TiO x /Pt/LiCoO2 multilayer system for the fabrication of all-solid-state lithium ion thin film microbatteries. Such micro-batteries typically utilize lithium cobalt oxide (LiCoO2) as cathode material with a platinum (Pt) current collector. Silicon nitride (Si3N4) is used to act as a barrier against Li diffusion into the substrate. For a good adherence between Si3N4 and Pt, commonly titanium (Ti) is used as intermediate layer. However, to achieve crystalline LiCoO2 the multilayer system has to be annealed at high temperature. This post-treatment initiates Ti diffusion into the Pt-collector and an oxidation to TiO x , leading to volume expansion and adhesion failures. To solve this adhesion problem, we introduce titanium oxide (TiO x ) as an adhesion layer, avoiding the diffusion during the annealing process. LiCoO2, Pt and Si3N4 layers were deposited by magnetron sputtering and the TiO x layer by thermal oxidation of Ti layers deposited by e-beam technique. As-deposited and annealed multilayer systems using various TiO x layer thicknesses were studied by scanning electron microscopy (SEM) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) and x-ray photoelectron spectroscopy (XPS). The results revealed that an annealing process at temperature of 700°C leads to different interactions of Ti atoms between the layers, for various TiO x layer thicknesses (25–45 nm).

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References

  1. V.K. Khanna, J. Phys. D Appl. Phys. 44, 034004 (2011).

    Article  Google Scholar 

  2. Y.R. Kosuri, T.R. Penki, M. Nookala, and P. Morgen, Adv. Mater. Lett. 4, 615 (2013).

    Google Scholar 

  3. H. Xia, S.B. Tang, and L. Lu, J. Korean Phys. Soc. 51, 1055 (2007).

    Article  Google Scholar 

  4. L. Maugeri, A. Iadecola, B. Joseph, L. Simonelli, L. Olivi, M. Okubo, I. Honma, H. Wadati, T. Mizokawa, and N.L. Saini, J. Phys. Condens. Matter 24, 335305 (2012).

  5. Y. Takahashi, N. Kijima, K. Tokiwa, T. Watanabe, and J. Akimoto, J. Phys.: Condens. Matter 19, 436202 (2007).

    Google Scholar 

  6. J.B. Bates, N.J. Dudney, B.J. Neudecker, F.X. Hart, H.P. Jun, and S.A. Hackney, J. Electrochem. Soc. 147, 59 (2000).

    Article  Google Scholar 

  7. M. Sathiya, A.S. Prakash, K. Ramesha, and A.K. Shukla, Materials (Basel). 2, 857 (2009).

    Article  Google Scholar 

  8. R. Weiland, D.F. Lupton, B. Fischer, J. Merker, C. Scheckenbach, and J. Witte, Platin. Met. Rev. 50, 158 (2006).

    Article  Google Scholar 

  9. S. Hsieh, D. Beck, T. Matsumoto, and B.E. Koel, Thin Solid Films 466, 123 (2004).

    Article  Google Scholar 

  10. T.C. Tisone, J. Vac. Sci. Technol. 9, 271 (1972).

    Article  Google Scholar 

  11. H.-J. Nam, D.-K. Choi, and W.-J. Lee, Thin Solid Films 371, 264 (2000).

    Article  Google Scholar 

  12. I.P. Koutsaroff, M. Zelner, P. Woo, L. Mcneil, M. Buchbinder, and A. Cervin-Lawry, Integr. Ferroelectr. 45, 97 (2002).

    Article  Google Scholar 

  13. X.S. Wang, Y.J. Wang, J. Yin, and Z.G. Liu, Scr. Mater. 46, 783 (2002).

    Article  Google Scholar 

  14. S. Mhin, K. Nittala, J. Lee, D.S. Robinson, J.F. Ihlefeld, G.L. Brennecka, L.M. Sanchez, R.G. Polcawich, and J.L. Jones, J. Am. Ceram. Soc. 97, 2973 (2014).

    Article  Google Scholar 

  15. L.H. Chong, K. Mallik, C.H. De Groot, and R. Kersting, J. Phys.: Condens. Matter 18, 645 (2006).

    Google Scholar 

  16. L. Tan, L. Pan, C. Cao, B. Wang, and L. Li, J. Power Sources 253, 193 (2014).

    Article  Google Scholar 

  17. H.-Y. Wu, M.-H. Hon, C.-Y. Kuan, and I.-C. Leu, J. Electron. Mater. 43, 1048 (2014).

    Article  Google Scholar 

  18. R. Sousa, J.F. Ribeiro, J.A. Sousa, R.T. Montenegro, L.M. Gonçalves, and J.H. Correia, Proceedings of the 24th micromechanics and microsystems Europe conference (MME) (Hanasaari—Helsinki, Finland, September 1–4, 2013)

  19. K.L. Parry, A.G. Shard, R.D. Short, R.G. White, J.D. Whittle, and A. Wright, Surf. Interface Anal. 38, 1497 (2006).

  20. J.H. Scofield, J. Electron Spectros. Relat. Phenomena 8, 129 (1976).

    Article  Google Scholar 

  21. S. Tanuma, C.J. Powell, and D.R. Penn, Surf. Interface Anal. 21, 165 (1994).

    Article  Google Scholar 

  22. M. Löffler, A. Vorobiev, L. Zeng, S. Gevorgian, and E. Olsson, J. Appl. Phys. 111, 124514 (2012).

    Article  Google Scholar 

  23. R. Ramesh, A. Inam, W.K. Chan, B. Wilkens, K. Myers, K. Remschnig, D.L. Hart, and J.M. Tarascon, Science 252, 944 (1991).

    Article  Google Scholar 

  24. S.D. Bernstein, T.Y. Wong, Y. Kisler, and R.W. Tustison, J. Mater. Res. 8, 12 (1993).

    Article  Google Scholar 

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Acknowledgements

This work was financially supported by FEDER/COMPETE and FCT funds with the Projects PTDC/EEA-ELC/114713/2009, PEst-C/QUI/UI0686/2013 and UID/EEA/04436/2013, first author scholarship SFRH/BPD/95905/2013 and second author scholarship SFRH/BD/78217/2011. This work was carried out with the support of the Karlsruhe Nano Micro Facility (KNMF, www.kit.edu/knmf), a Helmholtz Research Infrastructure at Karlsruhe Institute of Technology (KIT, www.kit.edu).

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Authors and Affiliations

  1. University of Minho, CMEMS UMINHO, Guimarães, Portugal

    E. M. F. Vieira, J. F. Ribeiro & L. M. Gonçalves

  2. Algoritmi Centre, University of Minho, Guimarães, Portugal

    J. F. Ribeiro

  3. DEI, University of Minho, Guimarães, Portugal

    R. Sousa

  4. Chemistry Center, University of Minho, Braga, Portugal

    M. M. Silva

  5. Université de Picardie Jules Verne, LRCS, UMR CNRS 7314, Amiens, France

    L. Dupont

Authors
  1. E. M. F. Vieira
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  2. J. F. Ribeiro
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  3. R. Sousa
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  4. M. M. Silva
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  5. L. Dupont
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  6. L. M. Gonçalves
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Correspondence to E. M. F. Vieira.

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Vieira, E.M.F., Ribeiro, J.F., Sousa, R. et al. Titanium Oxide Adhesion Layer for High Temperature Annealed Si/Si3N4/TiO x /Pt/LiCoO2 Battery Structures. J. Electron. Mater. 45, 910–916 (2016). https://doi.org/10.1007/s11664-015-4223-5

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  • DOI: https://doi.org/10.1007/s11664-015-4223-5

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