Isotopically enriched 10boron for use in pillar-structured neutron detectors was successfully etched in an electron cyclotron resonance (ECR) plasma using SF6-based plasmas. The effects of radio frequency (RF) power, ECR power, gas flow rate, H2 and O2 incorporation into the plasma, and gas mixture ratios were examined. Etch rates up to approximately 1.35 μm/min were realized. In addition, etch morphology was examined, and the final shape of 10boron-coated pillars could be controlled through the etch gas mixture utilized. Selectivity to the underlying Si structure was apparent from scanning electron microscopy (SEM) micrographs of completed etches.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
A. Rose, Nucl. Instrum. Methods 52, 166 (1967).
K. Osberg, N. Schemm, S. Balkir, J.I. Brand, M.S. Hallbeck, P.A. Dowben, and M.W. Hoffman, IEEE Sens. J. 6, 1531 (2006).
D.S. McGregor, R.T. Klann, H.K. Gersch, and Y.H. Yang, Nucl. Instrum. Methods Phys. Res., Sect. A 466, 126 (2001).
D.S. McGregor, R.T. Klann, H.K. Gersch, E. Ariesanti, J.D. Sanders, and B. Van Der Elzen, IEEE Trans. Nucl. Sci. 49, 1999 (2002).
J.K. Shultis and D.S. McGregor, IEEE Trans. Nucl. Sci. 53, 1659 (2006).
R.J. Nikolic, C.L. Cheung, C.E. Reinhardt, and T.F. Wang, Proc. SPIE 6013, 36 (2005).
R.J. Nikolic, A.M. Conway, C.E. Reinhardt, R.T. Graff, T.F. Wang, N. Deo, and C.L. Cheung, Appl. Phys. Lett. 93, 133502 (2008).
G.F. Knoll, Radiation Detection and Measurement, 3rd ed. (New York: Wiley, 2000).
A.M. Conway, T.F. Wang, N. Deo, C.L. Cheung, and R.J. Nikolic. IEEE Trans. Nucl. Sci. 56, 2802 (2009).
H. Toyoda, T. Isozumi, H. Sugai, and T. Okuda, J. Nucl. Mater. 162, 732 (1989).
H. Toyoda, A. Hanami, and H. Sugai, Jpn. J. Appl. Phys. 29, 1322 (1990).
H. Toyoda, A. Hanami, M. Yamage, and H. Sugai, Jpn. J. Appl. Phys. 30, 514 (1991).
L.F. Voss, C.E. Reinhardt, R.T. Graff, A.M. Conway, R.J. Nikolic, N. Deo, and C.L. Cheung, Nucl. Instrum. Methods Phys. Res., Sect. A 606, 821 (2009).
N. Deo, J.R. Brewer, C.E. Reinhardt, R.J. Nikolic, and C.L. Cheung, J. Vac. Sci. Technol. B: Microelectron. Nanometer Struct.—Process., Meas., Phenom. 26, 1309 (2008).
R. d’Agostino and D.L. Flamm, J. Appl. Phys. 52, 162 (1981).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Voss, L.F., Reinhardt, C.E., Graff, R.T. et al. Etching of 10Boron with SF6-based Electron Cyclotron Resonance Plasmas for Pillar-Structured Thermal Neutron Detectors. J. Electron. Mater. 39, 263–267 (2010). https://doi.org/10.1007/s11664-009-1068-9
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11664-009-1068-9