Abstract
In order to deal with the phenomena of Cd evaporation from the raw materials and the heterogeneity caused by the larger-than-unity segregation coefficient of Zn in CdTe during the conventional vertical Bridgman method (VBM) growth of Cd1-xZnxTe (CZT), two modifications—Cd compensation and accelerated crucible rotation technique (ACRT)—are simultaneously adopted to the VBM. By a combination of VBM with the two modifications, several CZT ingots with the dimensions of ∼60×150 mm2 are grown. Structural, optical, and electrical characterization of the as-grown CZT crystals reveals that the application of Cd compensation and ACRT is of obvious efficiency in improving concentration homogeneity, reducing defect density, raising crystal quality and, therefore, upgrading the optoelectronic properties of CZT crystals. Nuclear spectra measurements of detectors fabricated from the as-grown crystals also indicate that both modifications can upgrade the detecting performance of CZT.
Similar content being viewed by others
References
T.E. Schlesinger, J.E. Toney, H. Yoon, E.Y. Lee, B.A. Brunett, L. Franks, and R.B. James Mater. Sci. Eng. Rep. 32, 103 (2001).
M. Fiederle, T. Feltgen, J. Meinhardt, M. Rogalla, and K.W. Benz, J. Cryst. Growth 197, 635 (1999).
G.F. Neumark, Mater. Sci. Eng. Rep. 21, 1 (1997).
Y. Eisen and A. Shor, J. Cryst. Growth 184, 1302 (1998).
A.E. Bolotnikov, C.M. Hubert Chen, W.R. Cook, F.A. Harrision, I. Kuvvetli, S.M. Schindler, C.M. Stahle, and B.H. Parker, Nucl. Instrum. Methods A 510, 300 (2003).
A.S. Alikhanian, V.N. Guskov, A.M. Natarovsky, J.H. Greenberg, M. Fiederle, and K.W. Benz, J. Cryst. Growth 240, 73 (2002).
S. Sen and J.E. Stannard, Progr. Cryst. Growth Characterization 29, 253 (1994).
M. Fiederle, V. Babentsov, J. Franc, A. Fauler, and J.-P. Konrath, Cryst. Res. Technol. 38, 588 (2003).
H.R. Vydyanath, J.A. Ellsworth, and R.F. Fisher, J. Electron. Mater. 22, 1067 (1993).
J.H. Greenberg, J. Cryst. Growth 197, 406 (1999).
Z.J. Li, J. Appl. Phys. 90, 260 (2001).
P. Rudolph, Progr. Cryst. Growth Characterization 29, 275 (1994).
P. Capper, Progr. Cryst. Growth Characterization Mater. 28, 1 (1994).
S. Kuppurao, S. Brandon, and J.J. Derby, J. Cryst. Growth 158, 459 (1996).
X. Liu, W. Jie, and Y. Zhou, J. Cryst. Growth 219, 22 (2000).
G. Li, W. Jie, T. Wang, and Z. Gu, Semicond. Sci. Technol. 19, 457 (2004).
T.S. Moss, Handbook on Semiconductors (Amsterdam: North Holland Press Inc, 1980), pp. 681–689.
P. Rudolph, S. Kawasaki, S. Yamashita, Y. Usuki, Y. Konagaya, S. Matada, S. Yamamoto, and T. Fukuda, J. Cryst. Growth 149, 201 (1995).
P. Rudolph, A. Engel, I. Schentke, and A. Grochocki, J. Cryst. Growth 147, 297 (1995).
R.D.S. Yadava, B.S. Sundersheshu, M. Anandan, R.K. Bagai, and W.N. Borle, J. Electron. Mater. 23, 1349 (1994).
M. Azoulay, S. Petter, and G. Gafni, J. Cryst. Growth 101, 256 (1990).
J.B. Mullin and B.W. Stranghan, Revue Phys. Appl. 12, 267 (1997).
Y. Li (Doctoral Dissertation, Northwestern Polytechnical University, 2002).
Y.B. Qian, W.B. Sang, L.J. Wang, W.M. Shi, and J.H. Ming, Chin. J. Infrared 20, 17 (1998).
D. Feng, Condensed Matter Physics, Vol. 1: Structure and Defects (Beijing: Science Press, 1998), pp. 33–68.
K. Huang and R.Q. Han, Solid State Physics (Beijing: High Education Press, 2002), pp. 79–102.
M. Mühlberg, P. Rudolph, C. Genzel, B. Wermke, and U. Becker, J. Cryst. Growth 101, 275 (1990).
G. Li, W. Jie, Z. Gu, and H. Hua, Chin. Phys. Lett. 20, 1600 (2003).
M. Lax and E. Burstein, Phys. Rev. 97, 39 (1955).
Y. Sun, Semiconductor Measurement Technology (Beijing: Metallurgy Industrial Press, 1984), pp. 563–580.
G. Li, W. Jie, T. Wang, and G. Yang, Nucl. Instrum. Methods A 53, 511 (2004).
P. Cheuvat, U. El-Hanany, D. Schneider, and R. Triboulet, J. Cryst. Growth 138, 249 (1994).
M.F. Li, Semiconductor Physics (Beijing: Science Press, 2000).
J.B. Xia, Current Semiconductor Physics (Beijing: Peking University Press, 2000), pp. 138–168.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Li, G., Zhang, X., Hua, H. et al. A modified vertical Bridgman method for growth of high-quality Cd1−xZnxTe crystals. J. Electron. Mater. 34, 1215–1224 (2005). https://doi.org/10.1007/s11664-005-0266-3
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/s11664-005-0266-3