Abstract
The effects of various elements of substrate metallization, namely, Au, Ni, and P, on the solder/under-bump metallization (UBM), (Al/Ni(V)/Cu) interfacial reactions in flip-chip packages during multiple reflow processes were systematically investigated. It was found that Au and P had negligible effects on the liquid-solid interfacial reactions. However, Ni in the substrate metallization greatly accelerated the interfacial reactions at chip side and degraded the thermal stability of the UBM through formation of a (Cu,Ni)6Sn5 ternary compound at the solder/UBM interface. This phenomenon can be explained in terms of enhanced grain-boundary grooving on (Cu,Ni)6Sn5 in the molten solder during the reflow process. This could eventually cause the rapid spalling of an intermetallic compound (IMC) from the solder/UBM interface and early failure of the packages. Our results showed that formation of multicomponent intermetallics, such as (Cu,Ni)6Sn5 or (Ni,Cu)3Sn4, at the solder/UBM interface is detrimental to the solder-joint reliability.
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References
The International Technology Road Map for Semiconductors (San Jose, CA: Semiconductors Industry Association, 1999).
D.R. Frear, J.W. Jang, J.K. Lin, and C. Zhang, JOM 53, 28 (2001).
A.A. Liu, H.K. Kim, K.N. Tu, and P.A. Totta, J. Appl. Phys. 80, 2774 (1996).
H.K. Kim, K.N. Tu, and P.A. Totta, Appl. Phys. Lett. 68, 2204 (1996).
R. Aschenbrenner, A. Ostmann, G. Motulla, E. Zakel, and H. Reichl, IEEE Trans. Comp. Packag. Manuf. Technol. Part C 20, 95 (1997).
P. Elenius, Solid State Technol. p. 45 (April 1999).
C.Y. Liu, K.N. Tu, T.T. Sheng, C.H. Tung, D.R. Frear, and P. Elenius, J. Appl. Phys. 87, 750 (2000).
P.S. Teo, Y.W. Huang, C.H. Tung, M.R. Marks, and T.B. Lim, Proc. 50st Electron. Comp. Technol. Conf. (Piscataway, NJ: IEEE, 2000), pp. 33–39.
H. Balkan, J. Sanchez, G. Burgess, M. Johnson, C. Carlson, B. Rooney, F. Stepniak, J. Wood, D. Patterson, and P. Elenius, Flip Chip Technology Workshop (Reston: IMAPS, 2001), pp. 426–448.
M. Li, F. Zhang, W.T. Chen, K.N. Tu, K. Zeng, H. Balkan, and P. Elenius, J. Mater. Res. 17, 2757 (2002).
F. Zhang, M. Li, B. Bavani, and W.T. Chen, J. Electron. Mater. 31, 1256 (2002).
K. Zeng, V. Vuorinen, and J.K. Kivilahti, Proc. 51st Electronic Components and Technology Conf. (Piscataway, NJ: IEEE, 2001), pp. 693–698.
A. Zribi, A. Clark, L. Zavalij, P. Borgesen, and E.J. Cotts, J. Electron. Mater. 30, 1157, (2001).
W.T. Chen, C.E. Ho, and C.R. Kao, J. Mater. Res. 17, 263 (2002).
M.L. Zhang and C.C. Chum, Proc. 52nd ECTC (Piscataway, NJ: IEEE, 2002), pp. 726–731.
W.G. Bader, Welding J: Res. Suppl. 48, 551s (1969).
R.K. Kinyanjui, A. Zribi, and E.J. Cotts, Proc. 52nd ECTC, (Piscataway, NJ: IEEE, 2002), pp. 161–167.
V.I. Dybkov, Growth Kinetics of Chemical Compound Layers (Cambridge, England: Cambridge International Science, 1998), pp. 135–139.
W.W. Mullins, Trans. TMS-AIME 218, 354 (1960).
B. Joseph, F. Barbier, G. Dagoury, and M. Aucouturier, Scripta Mater. 39, 775 (1998).
H.J. Vogel and L. Ratke, Acta Metall. Mater. 39, 641 (1991).
D. Chatain, E. Rabkin, J. Derenne, and J. Bernardini, Acta Mater. 49, 1123 (2001).
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Zhang, F., Li, M., Chum, C.C. et al. Effects of substrate metallization of solder/under-bump metallization interfacial reactions in flip-chip packages during multiple reflow cycles. J. Electron. Mater. 32, 123–130 (2003). https://doi.org/10.1007/s11664-003-0182-3
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DOI: https://doi.org/10.1007/s11664-003-0182-3