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Wettability of electroless Ni in the under bump metallurgy with lead free solder

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Abstract

This study investigates the wettability of several lead-free solders, including Sn, Sn−Ag, and Sn−Bi, on electroless Ni (EN) with various phosphorus content. The role of phosphorus on solder wettability is studied. Microstructure evolution in the lead-free solder/EN joint is investigated with the aid of electron probe microanalyzer (EPMA) to relate metallurgical reactions between the solder and the EN. The SN solder exhibits better wettability on EN, while the Si−Bi solder has a larger contact angle. Wettability degrades as the phosphorus content in EN decreases. The dependence of wetting angle on the phosphorous content can be attributed to the surface roughness and density of EN, along with the interfacial reaction between the solders and EN. An EPMA analysis reveals the presence of a Sn−Bi−Ni−P solid solution at the interface of solder/EN joints due to the interdiffusion of major constituent Ni and Sn. The interaction zone of the solid solution increases with increasing temperature. Wettability of Pb-free solders on EN degrades with the presence of NiO due to oxidation or the existence of Ni3P due to precipitation after annealing. For an adequate wetting behavior in the Sn (Sn−Bi, Sn−Ag)/EN joint, EN deposited with phosphorus contents in the range of 9 to 12 wt% is suggested.

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References

  1. R.C. Marrs, B. Freyman, and J. Martin, Electron. Manuf. Technol. Symp. (Piscataway, NJ: IEEE, 1993), p. 41.

    Google Scholar 

  2. Z. Mei, M. Kaufmann, A. Eslambolchi, and P. Johnson, Proc. 48th Electron. Components and Technol. Conf. (Piscataway, NJ: IEEE, 1998), p. 952.

    Google Scholar 

  3. R.C. Marrs, Proc. 2nd Int. Conf. and Exhibition on Multichip Modules (Piscataway, NJ: IEEE, 1993), p. 220.

    Google Scholar 

  4. R.C. Groover, C. Huang, and A. Hamzehdoost, Proc. 1st Int. Symp. Flip Chip Technol., 1994, p. 57.

  5. D.R. Frear, F.M. Hosking, and P.T. Vianco, Materials Developments in Microelectronic Packaging and Reliability (Materials Park, OH: ASM, 1991, 1991), p. 229.

    Google Scholar 

  6. C.Y. Lee and K.L. Lin, Thin Solid Films 249, 201 (1994).

    Article  CAS  Google Scholar 

  7. C.Y. Lee and K.L. Lin, Jpn. J Appl. Phys. 33, 4708 (1994).

    Article  CAS  Google Scholar 

  8. D.W. Baudrand, Plating and Surface Finishing 68, 57 (1981).

    CAS  Google Scholar 

  9. J. Glazer, Int. Mater. Rev. 40, 65 (1995).

    CAS  Google Scholar 

  10. S.K. Kang, R.S. Rai, and S. Purushothaman, J. Electron. Mater. 25, 1113 (1996).

    CAS  Google Scholar 

  11. T. Massalski, Binary Alloy Phase Diagram (Materials Park, OH: ASM, 1986), p. 540.

    Google Scholar 

  12. K.L. Lin and J.M. Jang, Mater. Chem. and Phys. 38, 33 (1994).

    Article  CAS  Google Scholar 

  13. H.W. Miao, M.S. Thesis, National Tsing Hua University, Hsinchu, Taiwan (1997).

  14. Y.Y. Wei, M.S. Thesis, National Tsing Hua University, Hsinchu, Taiwan (1997).

  15. J.H. Vincent, B.P. Richards, D.R. Wallis, I.A. Gunter, M. Wasewick, H.A. Steen, P.G., Harris, M.A. Whitmore, S.R. Billington, A.C. Harman, and E. Knight, Circuit World 19, 32 (1997).

    Google Scholar 

  16. C.D. Young, Ph.D. Disseration, National Tsing Hua University, Hsinchu, Taiwan (1997).

  17. R.B. Bird, W.E. Stewart, and E.N. Lightfoot, Transport Phenomena (New York: John Wiley & Sons, 1960), p. 29.

    Google Scholar 

  18. P. Nash, Phase Diagram of Binary Nickel Alloy (Materials Park, OH: ASM, 1991), p. 235.

    Google Scholar 

  19. R.N. Wenzel: Ind. Eng. Chem. 28, 998 (1936).

    Article  Google Scholar 

  20. R. Shuttleworth and G.L.J. Bailey, Disc. Faraday Soc. 3, 16 (1948).

    Article  Google Scholar 

  21. R.H. Dettre and R.E. Johnson, Ave. Chem. Ser. 43, 112 (1963).

    Google Scholar 

  22. C. Huh and S.G. Mason, J. Colloid Interface Sci. 60, 11 (1977).

    Article  CAS  Google Scholar 

  23. J.D. Eik and R.J. Good, J. Colloid Interface Sci. 53, 235 (1975).

    Article  Google Scholar 

  24. X.B. Zhou and J.Th.M. DeHosson, J. Mater. Res. 10, 1984 (1995).

    CAS  Google Scholar 

  25. Y.Y. Chen, J.G. Duh, and B.S. Chiou, J. Mater. Sci.: Mater. Electron. 11, 279 (2000).

    Article  CAS  Google Scholar 

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Young, BL., Duh, JG. & Chiou, BS. Wettability of electroless Ni in the under bump metallurgy with lead free solder. J. Electron. Mater. 30, 543–553 (2001). https://doi.org/10.1007/s11664-001-0096-x

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  • DOI: https://doi.org/10.1007/s11664-001-0096-x

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