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A numerical study of oxidation behavior during reactive atomization and deposition

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Abstract

The oxidation behavior of droplets during reactive atomization and deposition (RAD) is analyzed on the basis of a numerical framework proposed here. Commercial 5083 Al is chosen as a model material; moreover, in the numerical model, nonspherical droplets are approximated as cylinders with a length/diameter ratio of 3. An equation that represents the growth rate of the oxide phases, together with models that describe the dynamic and thermal behavior of droplets, is implemented in an effort to elucidate the oxidation behavior of individual droplets. The numerical results reveal that the oxidation rate of a droplet is extremely high and that the oxide phase grows very rapidly initially, eventually attaining a steady state of limited oxide growth. The overall volume fraction of oxide phases in the RAD material increases with increasing atomization pressure, superheat temperature, and O2 concentration, whereas it decreases with increasing melt flow rate. The oxygen concentrations in the RAD powders and deposited materials predicted on the basis of numerical analysis are in good agreement with the results from chemical analysis when O2 concentration is lower than 16 vol pct.

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Authors and Affiliations

  1. the Department of Chemical Engineering and Materials Science, University of California, 95616-5294, Davis, CA

    Yaojun Lin (Postgraduate Researcher), Yizhang Zhou (Associate Researcher) & Enrique J. Lavernia (Professor)

Authors
  1. Yaojun Lin
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  2. Yizhang Zhou
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  3. Enrique J. Lavernia
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Lin, Y., Zhou, Y. & Lavernia, E.J. A numerical study of oxidation behavior during reactive atomization and deposition. Metall Mater Trans B 35, 1173–1185 (2004). https://doi.org/10.1007/s11663-004-0072-y

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  • DOI: https://doi.org/10.1007/s11663-004-0072-y

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