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Microstructure of Ti-48.2 at. Pct Ni shape memory thin films

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Abstract

Amorphous thin films of Ti-48.2 at. pct Ni formed by sputtering were annealed at 773 K for 5 minutes, 1 hour, and 10 hours. It was found by transmission electron microscopy (TEM) that the microstructure changes in the sequence of (1) Guinier-Preston (GP) zones for 5 minutes, (2) GP zones and Ti2Ni precipitates for 1 hour, and (3) Ti2Ni precipitates for 10 hours. A high-resolution electron microscope (HREM) revealed that Ti2Ni precipitates have partial coherency with the TiNi matrix.

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Authors and Affiliations

  1. the National Research Institute for Metals, 305, Tsukuba, Ibaraki, Japan

    A. Ishida (Subgroup Leader), K. Ogawa (Senior Researcher) & M. Sato (Researcher)

  2. the Institute of Materials Science, University of Tsukuba, 305, Tsukuba, Ibaraki, Japan

    S. Miyazaki (Associate Professor)

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  1. A. Ishida
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  2. K. Ogawa
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  3. M. Sato
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  4. S. Miyazaki
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Ishida, A., Ogawa, K., Sato, M. et al. Microstructure of Ti-48.2 at. Pct Ni shape memory thin films. Metall Mater Trans A 28, 1985–1991 (1997). https://doi.org/10.1007/s11661-997-0155-x

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  • DOI: https://doi.org/10.1007/s11661-997-0155-x

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