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Fabrication of copper nanorods by low-temperature metal organic chemical vapor deposition

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Chinese Science Bulletin

Abstract

Copper nanorods have been synthesized in mesoporous SBA-15 by a low-temperature metal organic chemical vapor deposition (MOCVD) employing copper (II) acetylacetonate, Cu(acac)2, and hydrogen as a precursor and reactant gas, respectively. The hydrogen plays an important role in chemical reduction of organometallic precursor which enhances mass transfer in the interior of the SBA-15 porous substrate. Such copper nanostructures are of great potentials in the semiconductor due to their unusual optical, magnetic and electronic properties. In addition, it has been found that chemically modifying the substrate surface by carbon deposition is crucial to such synthesis of copper nanostructures in the interior of the SBA-15, which is able to change the surface properties of SBA-15 from hydrophilic to hydrophobic to promote the adsorption of organic cupric precursor. It has also been found that the copper nanoparticles deposited on the external surface are almost eliminated and the copper nanorods are more distinct while the product was treated with ammonia. This approach could be achieved under a mild condition: a low temperature (400°C) and vacuum (2 kPa) which is extremely milder than the conventional method. It actually sounds as a foundation which is the first time to synthesize a copper nanorod at a mild condition of a low reaction temperature and pressure.

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Authors and Affiliations

  1. State Key Laboratory for Heavy Oil Processing, Key Laboratory of Catalysis, CNPC, University of Petroleum, Dongying, 257061, China

    Zhang Ying & Yan Zifeng

  2. Department of Chemical Engineering, The Hong Kong University of Science and Technology, JiuLong, Hong Kong, China

    Zhang Ying, Frank Leung-Yuk Lam & Hu Xijun

Authors
  1. Zhang Ying
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  2. Frank Leung-Yuk Lam
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  3. Hu Xijun
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  4. Yan Zifeng
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Correspondence to Zhang Ying.

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Zhang, Y., Lam, F.LY., Hu, X. et al. Fabrication of copper nanorods by low-temperature metal organic chemical vapor deposition. CHINESE SCI BULL 51, 2662–2668 (2006). https://doi.org/10.1007/s11434-006-2128-7

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  • DOI: https://doi.org/10.1007/s11434-006-2128-7

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