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Large area mold fabrication for the nanoimprint lithography using electron beam lithography

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Abstract

The mold fabrication is a critical issue for the development of nanoimprint lithography as an effective low-cost and mass production process. This paper describes the fabrication process developed to fabricate the large area nanoimprint molds on the silicon wafers. The optimization of e-beam exposure dose and pattern design is presented. The overlayer process is developed to improve the field stitching accuracy of e-beam exposure, and around 10 nm field stitching accuracy is obtained. By means of the optimization of the e-beam exposure dose, pattern design and overlayer process, large area nanoimprint molds having dense line structures with around 10 nm field stitching accuracy have been fabricated. The fabricated mold was used to imprint commercial imprinting resist.

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Authors and Affiliations

  1. Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian, 116024, China

    JinKui Chu, FanTao Meng, ZhiTao Han & Qing Guo

  2. Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, 116024, China

    JinKui Chu, FanTao Meng, ZhiTao Han & Qing Guo

Authors
  1. JinKui Chu
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  2. FanTao Meng
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  3. ZhiTao Han
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  4. Qing Guo
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Corresponding author

Correspondence to JinKui Chu.

Additional information

This work was supported by the National Basic Research Program of China (Grant No. 2006CB00407), the National Natural Science Foundation of China (Grant No. 50775017) and the Program for New Century Excellent Talents in University (Grant No. NCET-04-0266).

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Chu, J., Meng, F., Han, Z. et al. Large area mold fabrication for the nanoimprint lithography using electron beam lithography. Sci. China Ser. E-Technol. Sci. 53, 248–252 (2010). https://doi.org/10.1007/s11431-009-0320-0

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  • DOI: https://doi.org/10.1007/s11431-009-0320-0

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