Abstract
A series of (Y(AcO)3·4H2O—Q—Solv) solutions (Q is monoethanolamine (MEA), diethanolamine (DEA), en, dien; Solv = MeOH, EtOH, PriOH, BuOH) was studied to choose the metal-organic precursor for surface smoothing treatment of metallic tapes by chemical deposition of nanocrystalline yttria films. Based on the results of viscosity, wetting angle, and thermal stability measurements, a solution (Y(AcO)3·4H2O—dien—PriOH) was proposed as a new metal-organic precursor. After chemical deposition of nanocrystalline yttria films about 300 nm thick on a Hastelloy C-276 metallic tape the surface roughness was reduced by a factor of 11 (from 9.0 to 0.8 nm on a surface area of 5×5 μm2).
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Published in Russian in Izvestiya Akademii Nauk. Seriya Khimicheskaya, No. 6, pp. 1454–1458, June, 2013.
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Martynova, I.A., Tsymbarenko, D.M., Kamenev, A.A. et al. Chemical deposition of smooth nanocrystalline Y2O3 films from solutions of metal-organic precursors. Russ Chem Bull 62, 1454–1458 (2013). https://doi.org/10.1007/s11172-013-0209-8
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DOI: https://doi.org/10.1007/s11172-013-0209-8