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Quality factor enhanced plasmonic grating sensor in the near infrared region of application

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Abstract

The application of silicon grating-enabled nanostructure for refractive index sensing in the near-infrared region is reported in this work utilizing surface plasmon resonance (SPR) phenomena. This grating helps in launching the plasmon modes efficiently towards the flat metal film deposited with a thin Al2O3 layer. Numerical simulation is performed based on rigorous coupled-wave analysis (RCWA) method using wavelength interrogation with a fixed incidence angle. The normal incidence light is used which can be helpful for its integration with optical fiber. The proposed structure has shown sensitive (with a sensitivity value of 1000 nm/RIU for analyte refractive index 1.32–1.33) and precise sensing behavior (average quality factor value of 650 RIU−1). Further analysis is extended toward the measurement of hemoglobin concentration in blood and possibility of gaseous sensing application (with high quality factor value of 2000 RIU−1) using the proposed structure. The performance analysis is presented in terms of well defined parameters of sensitivity and quality factor.

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Conceptualization, methodology, software, and original draft preparation, A.K.P; data curation, A.K.P and H.K; writing—review and editing, A.K.P and H.K. All authors have reviewed and agreed to the published version of the manuscript.

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Correspondence to Ankit Kumar Pandey.

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Pandey, A.K., Kumar, H. Quality factor enhanced plasmonic grating sensor in the near infrared region of application. Opt Quant Electron 55, 57 (2023). https://doi.org/10.1007/s11082-022-04327-x

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  • DOI: https://doi.org/10.1007/s11082-022-04327-x

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